ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL
The present application provides an array substrate and a manufacturing method therefor, and a display panel. A source-drain layer is prepared from a laminated metal layer. The laminated metal layer comprises a first metal layer, a second metal layer, and a third metal layer, which are arranged in a...
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| creator | CAO, Zuqiang DAI, Chao |
| description | The present application provides an array substrate and a manufacturing method therefor, and a display panel. A source-drain layer is prepared from a laminated metal layer. The laminated metal layer comprises a first metal layer, a second metal layer, and a third metal layer, which are arranged in a laminated manner. Twice etching performed on the laminated metal layer causes, in a formed source and drain, the width of the third metal layer to be smaller than or equal to the width of the second metal layer. Thus, the problem that undercut phenomenon is present in a laminated metal electrode of an existing array substrate is solved.
La présente invention concerne un substrat matriciel et son procédé de fabrication, et un panneau d'affichage. Une couche source-drain est préparée à partir d'une couche métallique stratifiée. La couche métallique stratifiée comprend une première couche métallique, une deuxième couche métallique et une troisième couche métallique, qui sont agencées de manière stratifiée. Deux fois |
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La présente invention concerne un substrat matriciel et son procédé de fabrication, et un panneau d'affichage. Une couche source-drain est préparée à partir d'une couche métallique stratifiée. La couche métallique stratifiée comprend une première couche métallique, une deuxième couche métallique et une troisième couche métallique, qui sont agencées de manière stratifiée. Deux fois</description><language>chi ; eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220210&DB=EPODOC&CC=WO&NR=2022027741A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220210&DB=EPODOC&CC=WO&NR=2022027741A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CAO, Zuqiang</creatorcontrib><creatorcontrib>DAI, Chao</creatorcontrib><title>ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL</title><description>The present application provides an array substrate and a manufacturing method therefor, and a display panel. A source-drain layer is prepared from a laminated metal layer. The laminated metal layer comprises a first metal layer, a second metal layer, and a third metal layer, which are arranged in a laminated manner. Twice etching performed on the laminated metal layer causes, in a formed source and drain, the width of the third metal layer to be smaller than or equal to the width of the second metal layer. Thus, the problem that undercut phenomenon is present in a laminated metal electrode of an existing array substrate is solved.
La présente invention concerne un substrat matriciel et son procédé de fabrication, et un panneau d'affichage. Une couche source-drain est préparée à partir d'une couche métallique stratifiée. La couche métallique stratifiée comprend une première couche métallique, une deuxième couche métallique et une troisième couche métallique, qui sont agencées de manière stratifiée. Deux fois</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxDApyjFQIDnUKDglyDHFVcPRzUfB19At1c3QOCQ3y9HNX8HUN8fB3UQjxcA1ydfMP0gErcfEMDvABagxw9HP14WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgZGQGRubmLoaGhMnCoABvksmQ</recordid><startdate>20220210</startdate><enddate>20220210</enddate><creator>CAO, Zuqiang</creator><creator>DAI, Chao</creator><scope>EVB</scope></search><sort><creationdate>20220210</creationdate><title>ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL</title><author>CAO, Zuqiang ; DAI, Chao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2022027741A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng ; fre</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>CAO, Zuqiang</creatorcontrib><creatorcontrib>DAI, Chao</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CAO, Zuqiang</au><au>DAI, Chao</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL</title><date>2022-02-10</date><risdate>2022</risdate><abstract>The present application provides an array substrate and a manufacturing method therefor, and a display panel. A source-drain layer is prepared from a laminated metal layer. The laminated metal layer comprises a first metal layer, a second metal layer, and a third metal layer, which are arranged in a laminated manner. Twice etching performed on the laminated metal layer causes, in a formed source and drain, the width of the third metal layer to be smaller than or equal to the width of the second metal layer. Thus, the problem that undercut phenomenon is present in a laminated metal electrode of an existing array substrate is solved.
La présente invention concerne un substrat matriciel et son procédé de fabrication, et un panneau d'affichage. Une couche source-drain est préparée à partir d'une couche métallique stratifiée. La couche métallique stratifiée comprend une première couche métallique, une deuxième couche métallique et une troisième couche métallique, qui sont agencées de manière stratifiée. Deux fois</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL |
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