MASK PLATE, MASK PLATE STRUCTURE AND MASK PLATE MANUFACTURING METHOD

The present disclosure relates to a mask plate, a mask plate structure and a mask plate manufacturing method, belonging to the field of evaporation. The mask plate comprises a mask plate main body and mask strips. The mask plate main body comprises a plurality of grooves, the plurality of grooves ar...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ZHOU, Junji, LUO, Xiaolong, LV, Wenxu, SHI, Yingdong, YI, Shuowen, YANG, Bowen, WU, Qingfeng, DU, Zhilin, ZHANG, Wenchang, MA, Chao, GUO, Dengjun
Format:	Patent
Sprache:	chi ; eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present disclosure relates to a mask plate, a mask plate structure and a mask plate manufacturing method, belonging to the field of evaporation. The mask plate comprises a mask plate main body and mask strips. The mask plate main body comprises a plurality of grooves, the plurality of grooves are distributed at intervals on a first surface of the mask plate main body, and a hollowed-out structure is arranged in each groove; and the mask strips are located on the mask plate main body, and a pattern region of each mask strip is located in an orthographic projection of the groove on the first surface. During the process of attaching the mask strips to a substrate, the substrate exerts, on the mask strips, a force towards the mask plate main body, so that the middle portion of each mask strip moves towards the groove, and there is no friction force between the middle portion of the mask strip and the substrate. During the process of lowering the substrate, the movement of the pattern regions of the mask strip