APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS
A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and gener...
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| creator | CAMPBELL, Christopher DANIELS, Kevin M BILOIU, Costel OLSON, Joseph C RYAN, Kevin T TEFERI, Minab B KURUNCZI, Peter F WALLACE, Jay R SINCLAIR, Frank |
| description | A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
Selon l'invention, un système de traitement peut comprendre une chambre à plasma utilisable pour générer un plasma, et un ensemble d'extraction, disposé le long d'un côté de la chambre à plasma. L'ensemble d'extraction peut comprendre une plaque d'extraction comprenant une ouverture d'extraction, la plaque d'extraction ayant une forme non plane, et la génération d'un faisceau ionique extrait à un angle d'incidence élevé par rapport à une perpendiculaire à un plan d'un substrat, lorsque le plan du substrat est disposé parallèlement au côté de la chambre à plasma. |
| format | Patent |
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Selon l'invention, un système de traitement peut comprendre une chambre à plasma utilisable pour générer un plasma, et un ensemble d'extraction, disposé le long d'un côté de la chambre à plasma. L'ensemble d'extraction peut comprendre une plaque d'extraction comprenant une ouverture d'extraction, la plaque d'extraction ayant une forme non plane, et la génération d'un faisceau ionique extrait à un angle d'incidence élevé par rapport à une perpendiculaire à un plan d'un substrat, lorsque le plan du substrat est disposé parallèlement au côté de la chambre à plasma.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211223&DB=EPODOC&CC=WO&NR=2021257224A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211223&DB=EPODOC&CC=WO&NR=2021257224A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CAMPBELL, Christopher</creatorcontrib><creatorcontrib>DANIELS, Kevin M</creatorcontrib><creatorcontrib>BILOIU, Costel</creatorcontrib><creatorcontrib>OLSON, Joseph C</creatorcontrib><creatorcontrib>RYAN, Kevin T</creatorcontrib><creatorcontrib>TEFERI, Minab B</creatorcontrib><creatorcontrib>KURUNCZI, Peter F</creatorcontrib><creatorcontrib>WALLACE, Jay R</creatorcontrib><creatorcontrib>SINCLAIR, Frank</creatorcontrib><title>APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS</title><description>A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
Selon l'invention, un système de traitement peut comprendre une chambre à plasma utilisable pour générer un plasma, et un ensemble d'extraction, disposé le long d'un côté de la chambre à plasma. L'ensemble d'extraction peut comprendre une plaque d'extraction comprenant une ouverture d'extraction, la plaque d'extraction ayant une forme non plane, et la génération d'un faisceau ionique extrait à un angle d'incidence élevé par rapport à une perpendiculaire à un plan d'un substrat, lorsque le plan du substrat est disposé parallèlement au côté de la chambre à plasma.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB2DAhwDHIMCQ1WcPRzUQiODA5x9VXw9HP2CXXx9HNX8PB09wDKuPu4KrhGhAQ5Ood4-vsp-AeEeDoH8zCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSS-HB_IwMjQyNTcyMjE0dDY-JUAQCNkypI</recordid><startdate>20211223</startdate><enddate>20211223</enddate><creator>CAMPBELL, Christopher</creator><creator>DANIELS, Kevin M</creator><creator>BILOIU, Costel</creator><creator>OLSON, Joseph C</creator><creator>RYAN, Kevin T</creator><creator>TEFERI, Minab B</creator><creator>KURUNCZI, Peter F</creator><creator>WALLACE, Jay R</creator><creator>SINCLAIR, Frank</creator><scope>EVB</scope></search><sort><creationdate>20211223</creationdate><title>APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS</title><author>CAMPBELL, Christopher ; DANIELS, Kevin M ; BILOIU, Costel ; OLSON, Joseph C ; RYAN, Kevin T ; TEFERI, Minab B ; KURUNCZI, Peter F ; WALLACE, Jay R ; SINCLAIR, Frank</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2021257224A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>CAMPBELL, Christopher</creatorcontrib><creatorcontrib>DANIELS, Kevin M</creatorcontrib><creatorcontrib>BILOIU, Costel</creatorcontrib><creatorcontrib>OLSON, Joseph C</creatorcontrib><creatorcontrib>RYAN, Kevin T</creatorcontrib><creatorcontrib>TEFERI, Minab B</creatorcontrib><creatorcontrib>KURUNCZI, Peter F</creatorcontrib><creatorcontrib>WALLACE, Jay R</creatorcontrib><creatorcontrib>SINCLAIR, Frank</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CAMPBELL, Christopher</au><au>DANIELS, Kevin M</au><au>BILOIU, Costel</au><au>OLSON, Joseph C</au><au>RYAN, Kevin T</au><au>TEFERI, Minab B</au><au>KURUNCZI, Peter F</au><au>WALLACE, Jay R</au><au>SINCLAIR, Frank</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS</title><date>2021-12-23</date><risdate>2021</risdate><abstract>A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
Selon l'invention, un système de traitement peut comprendre une chambre à plasma utilisable pour générer un plasma, et un ensemble d'extraction, disposé le long d'un côté de la chambre à plasma. L'ensemble d'extraction peut comprendre une plaque d'extraction comprenant une ouverture d'extraction, la plaque d'extraction ayant une forme non plane, et la génération d'un faisceau ionique extrait à un angle d'incidence élevé par rapport à une perpendiculaire à un plan d'un substrat, lorsque le plan du substrat est disposé parallèlement au côté de la chambre à plasma.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
| title | APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS |
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