SELF-HEALING OLIGOMERS AND THE USE THEREOF
Disclosed herein are self-healing oligomers according to the structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbon...
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| creator | LIN, Jim HE, Meng HSIEH, Sam |
| description | Disclosed herein are self-healing oligomers according to the structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
L'invention concerne des oligomères autocicatrisants selon la structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z ; dans laquelle UPy, D, m, U, q, a, G, n, k et Z sont définis et décrits davantage dans la description et l'oligomère possédant au moins 3 groupes de liaison uréthane et comprenant un squelette dérivé d'un polyéther-polyol, d'un polyester-polyol, d'un poly(diméthylsiloxane), d'un disulfure de polyol ou des combinaisons correspondantes. L'invention concerne également diverses compositions contenant de tels oligomères en tant que partie d'un constituant auto-cicatrisant, de telles compositions comprenant également un constituant monomère et/ou oligomère réactif facultatif et un constituant photo-initiateur. L'invention concerne en outre des articles durcis à partir des compositions décrites ailleurs à l'aide des oligomères décrits ailleurs. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2021202635A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2021202635A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2021202635A13</originalsourceid><addsrcrecordid>eNrjZNAKdvVx0_VwdfTx9HNX8PfxdPf3dQ0KVnD0c1EI8XBVCA12BdFBrv5uPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPtzfyMDIEIjNjE0dDY2JUwUAxMIlPQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SELF-HEALING OLIGOMERS AND THE USE THEREOF</title><source>esp@cenet</source><creator>LIN, Jim ; HE, Meng ; HSIEH, Sam</creator><creatorcontrib>LIN, Jim ; HE, Meng ; HSIEH, Sam</creatorcontrib><description>Disclosed herein are self-healing oligomers according to the structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
L'invention concerne des oligomères autocicatrisants selon la structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z ; dans laquelle UPy, D, m, U, q, a, G, n, k et Z sont définis et décrits davantage dans la description et l'oligomère possédant au moins 3 groupes de liaison uréthane et comprenant un squelette dérivé d'un polyéther-polyol, d'un polyester-polyol, d'un poly(diméthylsiloxane), d'un disulfure de polyol ou des combinaisons correspondantes. L'invention concerne également diverses compositions contenant de tels oligomères en tant que partie d'un constituant auto-cicatrisant, de telles compositions comprenant également un constituant monomère et/ou oligomère réactif facultatif et un constituant photo-initiateur. L'invention concerne en outre des articles durcis à partir des compositions décrites ailleurs à l'aide des oligomères décrits ailleurs.</description><language>eng ; fre</language><subject>ADHESIVES ; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; GENERAL PROCESSES OF COMPOUNDING ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS THEREFOR ; WOODSTAINS ; WORKING-UP</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211007&DB=EPODOC&CC=WO&NR=2021202635A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211007&DB=EPODOC&CC=WO&NR=2021202635A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIN, Jim</creatorcontrib><creatorcontrib>HE, Meng</creatorcontrib><creatorcontrib>HSIEH, Sam</creatorcontrib><title>SELF-HEALING OLIGOMERS AND THE USE THEREOF</title><description>Disclosed herein are self-healing oligomers according to the structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
L'invention concerne des oligomères autocicatrisants selon la structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z ; dans laquelle UPy, D, m, U, q, a, G, n, k et Z sont définis et décrits davantage dans la description et l'oligomère possédant au moins 3 groupes de liaison uréthane et comprenant un squelette dérivé d'un polyéther-polyol, d'un polyester-polyol, d'un poly(diméthylsiloxane), d'un disulfure de polyol ou des combinaisons correspondantes. L'invention concerne également diverses compositions contenant de tels oligomères en tant que partie d'un constituant auto-cicatrisant, de telles compositions comprenant également un constituant monomère et/ou oligomère réactif facultatif et un constituant photo-initiateur. L'invention concerne en outre des articles durcis à partir des compositions décrites ailleurs à l'aide des oligomères décrits ailleurs.</description><subject>ADHESIVES</subject><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAKdvVx0_VwdfTx9HNX8PfxdPf3dQ0KVnD0c1EI8XBVCA12BdFBrv5uPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPtzfyMDIEIjNjE0dDY2JUwUAxMIlPQ</recordid><startdate>20211007</startdate><enddate>20211007</enddate><creator>LIN, Jim</creator><creator>HE, Meng</creator><creator>HSIEH, Sam</creator><scope>EVB</scope></search><sort><creationdate>20211007</creationdate><title>SELF-HEALING OLIGOMERS AND THE USE THEREOF</title><author>LIN, Jim ; HE, Meng ; HSIEH, Sam</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2021202635A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2021</creationdate><topic>ADHESIVES</topic><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>LIN, Jim</creatorcontrib><creatorcontrib>HE, Meng</creatorcontrib><creatorcontrib>HSIEH, Sam</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIN, Jim</au><au>HE, Meng</au><au>HSIEH, Sam</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SELF-HEALING OLIGOMERS AND THE USE THEREOF</title><date>2021-10-07</date><risdate>2021</risdate><abstract>Disclosed herein are self-healing oligomers according to the structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
L'invention concerne des oligomères autocicatrisants selon la structure [UPy - (Dm - U -Dm)(2+q)] - [A(G)(n-1) - Dm]k - Z ; dans laquelle UPy, D, m, U, q, a, G, n, k et Z sont définis et décrits davantage dans la description et l'oligomère possédant au moins 3 groupes de liaison uréthane et comprenant un squelette dérivé d'un polyéther-polyol, d'un polyester-polyol, d'un poly(diméthylsiloxane), d'un disulfure de polyol ou des combinaisons correspondantes. L'invention concerne également diverses compositions contenant de tels oligomères en tant que partie d'un constituant auto-cicatrisant, de telles compositions comprenant également un constituant monomère et/ou oligomère réactif facultatif et un constituant photo-initiateur. L'invention concerne en outre des articles durcis à partir des compositions décrites ailleurs à l'aide des oligomères décrits ailleurs.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES FILLING PASTES GENERAL PROCESSES OF COMPOUNDING INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS WORKING-UP |
| title | SELF-HEALING OLIGOMERS AND THE USE THEREOF |
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