THERMAL TREATMENT DEVICE AND THERMAL TREATMENT METHOD

Provided is a technology capable of promoting a change in solubility when thermally treating a substrate having a surface having an exposed resist formed thereon which exhibits a change in the solubility of an exposed or unexposed section thereof in a liquid developer as a result of heating by react...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAWAKAMI Shinichiro, ONITSUKA Tomoya, SANO Yohei
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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