STABILIZATION OF CARBON DEPOSITION PRECURSORS LIKE C2H2
The present disclosure relates to compositions including a mixture or solution of acetylene and a stabilizer. In particular embodiments, the composition is a stabilized composition including pressurized acetylene. La présente invention concerne des compositions comprenant un mélange ou une solution...
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| creator | LAVOIE, Adrien REDDY, Kapu Sirish |
| description | The present disclosure relates to compositions including a mixture or solution of acetylene and a stabilizer. In particular embodiments, the composition is a stabilized composition including pressurized acetylene.
La présente invention concerne des compositions comprenant un mélange ou une solution d'acétylène et un stabilisant. Selon des modes de réalisation particuliers, la composition est une composition stabilisée comprenant de l'acétylène sous pression. |
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La présente invention concerne des compositions comprenant un mélange ou une solution d'acétylène et un stabilisant. Selon des modes de réalisation particuliers, la composition est une composition stabilisée comprenant de l'acétylène sous pression.</description><language>eng ; fre</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; CHEMISTRY ; METALLURGY ; ORGANIC CHEMISTRY</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210916&DB=EPODOC&CC=WO&NR=2021183922A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210916&DB=EPODOC&CC=WO&NR=2021183922A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LAVOIE, Adrien</creatorcontrib><creatorcontrib>REDDY, Kapu Sirish</creatorcontrib><title>STABILIZATION OF CARBON DEPOSITION PRECURSORS LIKE C2H2</title><description>The present disclosure relates to compositions including a mixture or solution of acetylene and a stabilizer. In particular embodiments, the composition is a stabilized composition including pressurized acetylene.
La présente invention concerne des compositions comprenant un mélange ou une solution d'acétylène et un stabilisant. Selon des modes de réalisation particuliers, la composition est une composition stabilisée comprenant de l'acétylène sous pression.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>CHEMISTRY</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAPDnF08vTxjHIM8fT3U_B3U3B2DHICslxcA_yDPcGCAUGuzqFBwf5BwQo-nt6uCs5GHkY8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-3N_IwMjQ0MLY0sjI0dCYOFUA5MkpGw</recordid><startdate>20210916</startdate><enddate>20210916</enddate><creator>LAVOIE, Adrien</creator><creator>REDDY, Kapu Sirish</creator><scope>EVB</scope></search><sort><creationdate>20210916</creationdate><title>STABILIZATION OF CARBON DEPOSITION PRECURSORS LIKE C2H2</title><author>LAVOIE, Adrien ; REDDY, Kapu Sirish</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2021183922A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2021</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>CHEMISTRY</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><toplevel>online_resources</toplevel><creatorcontrib>LAVOIE, Adrien</creatorcontrib><creatorcontrib>REDDY, Kapu Sirish</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LAVOIE, Adrien</au><au>REDDY, Kapu Sirish</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STABILIZATION OF CARBON DEPOSITION PRECURSORS LIKE C2H2</title><date>2021-09-16</date><risdate>2021</risdate><abstract>The present disclosure relates to compositions including a mixture or solution of acetylene and a stabilizer. In particular embodiments, the composition is a stabilized composition including pressurized acetylene.
La présente invention concerne des compositions comprenant un mélange ou une solution d'acétylène et un stabilisant. Selon des modes de réalisation particuliers, la composition est une composition stabilisée comprenant de l'acétylène sous pression.</abstract><oa>free_for_read</oa></addata></record> |
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| title | STABILIZATION OF CARBON DEPOSITION PRECURSORS LIKE C2H2 |
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