SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM

This sputtering target for a magnetic recording medium comprises: a metallic phase including at least one selected from among Mn and V, and Pt, with the balance comprising Co and inevitable impurities; and an oxide phase containing at least B and O. L'invention concerne une cible de pulvérisati...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAMADA, Tomonari, KUSHIBIKI, Ryousuke
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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