SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM
This sputtering target for a magnetic recording medium comprises: a metallic phase including at least one selected from among Mn and V, and Pt, with the balance comprising Co and inevitable impurities; and an oxide phase containing at least B and O. L'invention concerne une cible de pulvérisati...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; jpn |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KAMADA, Tomonari KUSHIBIKI, Ryousuke |
| description | This sputtering target for a magnetic recording medium comprises: a metallic phase including at least one selected from among Mn and V, and Pt, with the balance comprising Co and inevitable impurities; and an oxide phase containing at least B and O.
L'invention concerne une cible de pulvérisation pour un support d'enregistrement magnétique, comprenant : une phase métallique comprenant au moins un élément choisi parmi les éléments Mn et V, et l'élément Pt, le reste comprenant du Co et des impuretés inévitables ; et une phase oxyde contenant au moins les éléments B et O.
Ｍｎ及びＶから選択される少なくとも１種以上、Ｐｔ、残部がＣｏおよび不可避不純物からなる金属相と、少なくともＢとＯを含有する酸化物相と、からなる磁気記録媒体用スパッタリングターゲット。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2021010490A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2021010490A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2021010490A13</originalsourceid><addsrcrecordid>eNrjZNAPDggNCXEN8vRzVwhxDHJ3DVFw8w9S8HV093MN8XRWCHJ19g9yAcn6urp4hvryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL4cH8jAyNDA0MDE0sDR0Nj4lQBALDHJvU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM</title><source>esp@cenet</source><creator>KAMADA, Tomonari ; KUSHIBIKI, Ryousuke</creator><creatorcontrib>KAMADA, Tomonari ; KUSHIBIKI, Ryousuke</creatorcontrib><description>This sputtering target for a magnetic recording medium comprises: a metallic phase including at least one selected from among Mn and V, and Pt, with the balance comprising Co and inevitable impurities; and an oxide phase containing at least B and O.
L'invention concerne une cible de pulvérisation pour un support d'enregistrement magnétique, comprenant : une phase métallique comprenant au moins un élément choisi parmi les éléments Mn et V, et l'élément Pt, le reste comprenant du Co et des impuretés inévitables ; et une phase oxyde contenant au moins les éléments B et O.
Ｍｎ及びＶから選択される少なくとも１種以上、Ｐｔ、残部がＣｏおよび不可避不純物からなる金属相と、少なくともＢとＯを含有する酸化物相と、からなる磁気記録媒体用スパッタリングターゲット。</description><language>eng ; fre ; jpn</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210121&DB=EPODOC&CC=WO&NR=2021010490A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210121&DB=EPODOC&CC=WO&NR=2021010490A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAMADA, Tomonari</creatorcontrib><creatorcontrib>KUSHIBIKI, Ryousuke</creatorcontrib><title>SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM</title><description>This sputtering target for a magnetic recording medium comprises: a metallic phase including at least one selected from among Mn and V, and Pt, with the balance comprising Co and inevitable impurities; and an oxide phase containing at least B and O.
L'invention concerne une cible de pulvérisation pour un support d'enregistrement magnétique, comprenant : une phase métallique comprenant au moins un élément choisi parmi les éléments Mn et V, et l'élément Pt, le reste comprenant du Co et des impuretés inévitables ; et une phase oxyde contenant au moins les éléments B et O.
Ｍｎ及びＶから選択される少なくとも１種以上、Ｐｔ、残部がＣｏおよび不可避不純物からなる金属相と、少なくともＢとＯを含有する酸化物相と、からなる磁気記録媒体用スパッタリングターゲット。</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAPDggNCXEN8vRzVwhxDHJ3DVFw8w9S8HV093MN8XRWCHJ19g9yAcn6urp4hvryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL4cH8jAyNDA0MDE0sDR0Nj4lQBALDHJvU</recordid><startdate>20210121</startdate><enddate>20210121</enddate><creator>KAMADA, Tomonari</creator><creator>KUSHIBIKI, Ryousuke</creator><scope>EVB</scope></search><sort><creationdate>20210121</creationdate><title>SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM</title><author>KAMADA, Tomonari ; KUSHIBIKI, Ryousuke</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2021010490A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; jpn</language><creationdate>2021</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KAMADA, Tomonari</creatorcontrib><creatorcontrib>KUSHIBIKI, Ryousuke</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAMADA, Tomonari</au><au>KUSHIBIKI, Ryousuke</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM</title><date>2021-01-21</date><risdate>2021</risdate><abstract>This sputtering target for a magnetic recording medium comprises: a metallic phase including at least one selected from among Mn and V, and Pt, with the balance comprising Co and inevitable impurities; and an oxide phase containing at least B and O.
L'invention concerne une cible de pulvérisation pour un support d'enregistrement magnétique, comprenant : une phase métallique comprenant au moins un élément choisi parmi les éléments Mn et V, et l'élément Pt, le reste comprenant du Co et des impuretés inévitables ; et une phase oxyde contenant au moins les éléments B et O.
Ｍｎ及びＶから選択される少なくとも１種以上、Ｐｔ、残部がＣｏおよび不可避不純物からなる金属相と、少なくともＢとＯを含有する酸化物相と、からなる磁気記録媒体用スパッタリングターゲット。</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; jpn |
| recordid | cdi_epo_espacenet_WO2021010490A1 |
| source | esp@cenet |
| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T17%3A13%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAMADA,%20Tomonari&rft.date=2021-01-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2021010490A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |