A MIRROR CALIBRATING METHOD, A POSITION MEASURING METHOD, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

The invention provides a method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same...

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Hauptverfasser:	ADRIAENS, Johannes, SEELEN, Luuk, SCHOORMANS, Carolus
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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creator	ADRIAENS, Johannes SEELEN, Luuk SCHOORMANS, Carolus
description	The invention provides a method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. The invention further provides a position measuring method in which the obtained shape of the mirror is used to adjust the measurements in X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus. La présente invention concerne un procédé d'étalonnage d'un miroir d'un système d'interféromètre conçu pour mesurer une position d'un objet à l'aide de deux interféromètres du système d'interféromètre qui sont agencés sur des côtés opposés de l'objet et conçus pour mesurer la position de l'objet dans la même direction X, deux ensembles de mesures étant obtenus pour différentes orientations de rotation autour d'un axe perpendiculaire à la direction X pour déterminer une forme du miroir. La présente invention concerne, en outre, un procédé de mesure de position dans lequel la forme obtenue du miroir est utilisée pour ajuster les mesures dans la direction X, un appareil lithographique et un procédé de fabrication de dispositif utilisant ledit appareil lithographique.
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The invention further provides a position measuring method in which the obtained shape of the mirror is used to adjust the measurements in X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus. La présente invention concerne un procédé d'étalonnage d'un miroir d'un système d'interféromètre conçu pour mesurer une position d'un objet à l'aide de deux interféromètres du système d'interféromètre qui sont agencés sur des côtés opposés de l'objet et conçus pour mesurer la position de l'objet dans la même direction X, deux ensembles de mesures étant obtenus pour différentes orientations de rotation autour d'un axe perpendiculaire à la direction X pour déterminer une forme du miroir. La présente invention concerne, en outre, un procédé de mesure de position dans lequel la forme obtenue du miroir est utilisée pour ajuster les mesures dans la direction X, un appareil lithographique et un procédé de fabrication de dispositif utilisant ledit appareil lithographique.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TESTING</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210114&DB=EPODOC&CC=WO&NR=2021004709A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210114&DB=EPODOC&CC=WO&NR=2021004709A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ADRIAENS, Johannes</creatorcontrib><creatorcontrib>SEELEN, Luuk</creatorcontrib><creatorcontrib>SCHOORMANS, Carolus</creatorcontrib><title>A MIRROR CALIBRATING METHOD, A POSITION MEASURING METHOD, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD</title><description>The invention provides a method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. The invention further provides a position measuring method in which the obtained shape of the mirror is used to adjust the measurements in X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus. La présente invention concerne un procédé d'étalonnage d'un miroir d'un système d'interféromètre conçu pour mesurer une position d'un objet à l'aide de deux interféromètres du système d'interféromètre qui sont agencés sur des côtés opposés de l'objet et conçus pour mesurer la position de l'objet dans la même direction X, deux ensembles de mesures étant obtenus pour différentes orientations de rotation autour d'un axe perpendiculaire à la direction X pour déterminer une forme du miroir. 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The invention further provides a position measuring method in which the obtained shape of the mirror is used to adjust the measurements in X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus. La présente invention concerne un procédé d'étalonnage d'un miroir d'un système d'interféromètre conçu pour mesurer une position d'un objet à l'aide de deux interféromètres du système d'interféromètre qui sont agencés sur des côtés opposés de l'objet et conçus pour mesurer la position de l'objet dans la même direction X, deux ensembles de mesures étant obtenus pour différentes orientations de rotation autour d'un axe perpendiculaire à la direction X pour déterminer une forme du miroir. La présente invention concerne, en outre, un procédé de mesure de position dans lequel la forme obtenue du miroir est utilisée pour ajuster les mesures dans la direction X, un appareil lithographique et un procédé de fabrication de dispositif utilisant ledit appareil lithographique.</abstract><oa>free_for_read</oa></addata></record>
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
title	A MIRROR CALIBRATING METHOD, A POSITION MEASURING METHOD, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
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