SUPPORTING AN OPTICAL ELEMENT

The present invention relates to an arrangement of a microlithographic imaging device, particularly for using light in the extreme UV (EUV) range, comprising a holding device (110) for holding an optical element (109), wherein the optical element (109) comprises an optical surface (109.1) and define...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ANSELM, Eugen, KOERNER, Christian, MUELLER, Christoph
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!