METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydrocarbon-containing film from the composition (i); and (3...
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| creator | NAKASUGI, Shigemasa YANAGITA, Hiroshi SEKITO, Takashi HIRAYAMA, Taku |
| description | To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydrocarbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.
L'invention concerne la fourniture d'un procédé de fabrication d'un film durci ayant une densité de film élevée, une dureté de film élevée et une résistance à la gravure élevée. L'invention concerne également un procédé de fabrication d'un film durci consistant à (1) appliquer une composition (i) au-dessus d'un substrat ; (2) former un film contenant des hydrocarbures à partir de la composition (i) ; et (3) irradier le film contenant des hydrocarbures avec un plasma, un faisceau d'électrons et/ou des ions pour former un film durci. L'invention concerne également l'utilisation du film durci. |
| format | Patent |
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L'invention concerne la fourniture d'un procédé de fabrication d'un film durci ayant une densité de film élevée, une dureté de film élevée et une résistance à la gravure élevée. L'invention concerne également un procédé de fabrication d'un film durci consistant à (1) appliquer une composition (i) au-dessus d'un substrat ; (2) former un film contenant des hydrocarbures à partir de la composition (i) ; et (3) irradier le film contenant des hydrocarbures avec un plasma, un faisceau d'électrons et/ou des ions pour former un film durci. L'invention concerne également l'utilisation du film durci.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201029&DB=EPODOC&CC=WO&NR=2020216899A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201029&DB=EPODOC&CC=WO&NR=2020216899A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKASUGI, Shigemasa</creatorcontrib><creatorcontrib>YANAGITA, Hiroshi</creatorcontrib><creatorcontrib>SEKITO, Takashi</creatorcontrib><creatorcontrib>HIRAYAMA, Taku</creatorcontrib><title>METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME</title><description>To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydrocarbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.
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L'invention concerne la fourniture d'un procédé de fabrication d'un film durci ayant une densité de film élevée, une dureté de film élevée et une résistance à la gravure élevée. L'invention concerne également un procédé de fabrication d'un film durci consistant à (1) appliquer une composition (i) au-dessus d'un substrat ; (2) former un film contenant des hydrocarbures à partir de la composition (i) ; et (3) irradier le film contenant des hydrocarbures avec un plasma, un faisceau d'électrons et/ou des ions pour former un film durci. L'invention concerne également l'utilisation du film durci.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME |
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