SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising silica particles and alumina particles, wherein the alumina particles are surface coated with an anionic polymer, and (b) water. The invention also provides a method of chemically mechanically po...
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creator | HUANG, Hung-Tsung CHIEN, Chih-Hsien LU, Lung-Tai HUANG, Helin |
description | The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising silica particles and alumina particles, wherein the alumina particles are surface coated with an anionic polymer, and (b) water. The invention also provides a method of chemically mechanically polishing a substrate, especially a substrate comprising tungsten, silicon oxide, and nitride, with the polishing composition.
L'invention concerne une composition de polissage chimico-mécanique comprenant (a) un abrasif comprenant des particules de silice et des particules d'alumine, les particules d'alumine étant revêtues en surface par un polymère anionique, et (b) de l'eau. L'invention concerne également un procédé de polissage chimico-mécanique d'un substrat, en particulier un substrat comprenant du tungstène, de l'oxyde de silicium et du nitrure, avec la composition de polissage. |
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L'invention concerne une composition de polissage chimico-mécanique comprenant (a) un abrasif comprenant des particules de silice et des particules d'alumine, les particules d'alumine étant revêtues en surface par un polymère anionique, et (b) de l'eau. L'invention concerne également un procédé de polissage chimico-mécanique d'un substrat, en particulier un substrat comprenant du tungstène, de l'oxyde de silicium et du nitrure, avec la composition de polissage.</description><language>eng ; fre</language><subject>ADHESIVES ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; PREPARATION OF CARBON BLACK ; SKI WAXES ; TRANSPORTING ; TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201022&DB=EPODOC&CC=WO&NR=2020214662A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201022&DB=EPODOC&CC=WO&NR=2020214662A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HUANG, Hung-Tsung</creatorcontrib><creatorcontrib>CHIEN, Chih-Hsien</creatorcontrib><creatorcontrib>LU, Lung-Tai</creatorcontrib><creatorcontrib>HUANG, Helin</creatorcontrib><title>SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS</title><description>The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising silica particles and alumina particles, wherein the alumina particles are surface coated with an anionic polymer, and (b) water. The invention also provides a method of chemically mechanically polishing a substrate, especially a substrate comprising tungsten, silicon oxide, and nitride, with the polishing composition.
L'invention concerne une composition de polissage chimico-mécanique comprenant (a) un abrasif comprenant des particules de silice et des particules d'alumine, les particules d'alumine étant revêtues en surface par un polymère anionique, et (b) de l'eau. L'invention concerne également un procédé de polissage chimico-mécanique d'un substrat, en particulier un substrat comprenant du tungstène, de l'oxyde de silicium et du nitrure, avec la composition de polissage.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>PREPARATION OF CARBON BLACK</subject><subject>SKI WAXES</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAIDg1yc3R2VXD2dwxxdVFwdApyDPYMc1UIcAwK8XT2cQ1WcPMPUggJ9XMPDnH1U3AKdXNTcAwI8PF0dgzx9PcL5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgZAaGhiZmbkaGhMnCoAXDMrnw</recordid><startdate>20201022</startdate><enddate>20201022</enddate><creator>HUANG, Hung-Tsung</creator><creator>CHIEN, Chih-Hsien</creator><creator>LU, Lung-Tai</creator><creator>HUANG, Helin</creator><scope>EVB</scope></search><sort><creationdate>20201022</creationdate><title>SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS</title><author>HUANG, Hung-Tsung ; CHIEN, Chih-Hsien ; LU, Lung-Tai ; HUANG, Helin</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2020214662A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2020</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>PREPARATION OF CARBON BLACK</topic><topic>SKI WAXES</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES</topic><toplevel>online_resources</toplevel><creatorcontrib>HUANG, Hung-Tsung</creatorcontrib><creatorcontrib>CHIEN, Chih-Hsien</creatorcontrib><creatorcontrib>LU, Lung-Tai</creatorcontrib><creatorcontrib>HUANG, Helin</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HUANG, Hung-Tsung</au><au>CHIEN, Chih-Hsien</au><au>LU, Lung-Tai</au><au>HUANG, Helin</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS</title><date>2020-10-22</date><risdate>2020</risdate><abstract>The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive comprising silica particles and alumina particles, wherein the alumina particles are surface coated with an anionic polymer, and (b) water. The invention also provides a method of chemically mechanically polishing a substrate, especially a substrate comprising tungsten, silicon oxide, and nitride, with the polishing composition.
L'invention concerne une composition de polissage chimico-mécanique comprenant (a) un abrasif comprenant des particules de silice et des particules d'alumine, les particules d'alumine étant revêtues en surface par un polymère anionique, et (b) de l'eau. L'invention concerne également un procédé de polissage chimico-mécanique d'un substrat, en particulier un substrat comprenant du tungstène, de l'oxyde de silicium et du nitrure, avec la composition de polissage.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH PREPARATION OF CARBON BLACK SKI WAXES TRANSPORTING TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES |
title | SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS |
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