METHOD FOR MANUFACTURING CYLINDRICAL SPUTTERING TARGET

A method for manufacturing a cylindrical sputtering target, the method comprising a backing treatment step of applying a bonding material for backing treatment use onto at least one member selected from an inner peripheral surface of a cylindrical target material and an outer peripheral surface of a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OKANO Shin, OHTOMO Takeshi
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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