RAMAN SPECTROSCOPY SUBSTRATE AND APTASENSOR
The present invention relates to an inverse porous deposition film used for surface enhanced Raman spectroscopy, a method for manufacturing same, and a surface enhanced Raman spectroscopy substrate comprising same. The present invention relates to a Raman spectroscopy substrate, a method for manufac...
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| creator | YANG, Jae-Moon KIM, Jung-Hoon |
| description | The present invention relates to an inverse porous deposition film used for surface enhanced Raman spectroscopy, a method for manufacturing same, and a surface enhanced Raman spectroscopy substrate comprising same. The present invention relates to a Raman spectroscopy substrate, a method for manufacturing same, and an analysis device and analysis method comprising same. The present invention relates to an aptasensor comprising a substrate comprising a plurality of microgrooves, and a metal nanostructure fixed to a surface of the substrate.
La présente invention concerne un film de dépôt poreux inverse utile à une spectrométrie Raman exaltée de surface, son procédé de fabrication, et un substrat de spectrométrie Raman exaltée de surface le comprenant. La présente invention concerne un substrat de spectrométrie Raman, son procédé de fabrication, et un dispositif d'analyse ainsi qu'un procédé d'analyse le comprenant. La présente invention concerne un aptacapteur comprenant un substrat comprenant une pluralité de microrainures, et une nanostructure métallique fixée à une surface du substrat.
본 발명은 표면증강 라만 분광법에 사용되는 인버스 다공성 증착막, 이의 제조 방법 및 이를 포함하는 표면증강 라만 분광기판에 관한 것이다. 또한, 본 발명은 라만 분광 기판, 이의 제조 방법, 이를 포함하는 분석 장치 및 분석 방법에 관한 것이다. 또한, 본 발명은 압타 센서에 관한 것으로서, 상기 압타 센서는 복수개의 마이크로그루브들(microgrooves)을 포함하는 기판, 그리고 상기 기판의 표면에 고정된 금속 나노 구조체를 포함한다. |
| format | Patent |
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La présente invention concerne un film de dépôt poreux inverse utile à une spectrométrie Raman exaltée de surface, son procédé de fabrication, et un substrat de spectrométrie Raman exaltée de surface le comprenant. La présente invention concerne un substrat de spectrométrie Raman, son procédé de fabrication, et un dispositif d'analyse ainsi qu'un procédé d'analyse le comprenant. La présente invention concerne un aptacapteur comprenant un substrat comprenant une pluralité de microrainures, et une nanostructure métallique fixée à une surface du substrat.
본 발명은 표면증강 라만 분광법에 사용되는 인버스 다공성 증착막, 이의 제조 방법 및 이를 포함하는 표면증강 라만 분광기판에 관한 것이다. 또한, 본 발명은 라만 분광 기판, 이의 제조 방법, 이를 포함하는 분석 장치 및 분석 방법에 관한 것이다. 또한, 본 발명은 압타 센서에 관한 것으로서, 상기 압타 센서는 복수개의 마이크로그루브들(microgrooves)을 포함하는 기판, 그리고 상기 기판의 표면에 고정된 금속 나노 구조체를 포함한다.</description><language>eng ; fre ; kor</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; METALLURGY ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200507&DB=EPODOC&CC=WO&NR=2020091405A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200507&DB=EPODOC&CC=WO&NR=2020091405A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG, Jae-Moon</creatorcontrib><creatorcontrib>KIM, Jung-Hoon</creatorcontrib><title>RAMAN SPECTROSCOPY SUBSTRATE AND APTASENSOR</title><description>The present invention relates to an inverse porous deposition film used for surface enhanced Raman spectroscopy, a method for manufacturing same, and a surface enhanced Raman spectroscopy substrate comprising same. The present invention relates to a Raman spectroscopy substrate, a method for manufacturing same, and an analysis device and analysis method comprising same. The present invention relates to an aptasensor comprising a substrate comprising a plurality of microgrooves, and a metal nanostructure fixed to a surface of the substrate.
La présente invention concerne un film de dépôt poreux inverse utile à une spectrométrie Raman exaltée de surface, son procédé de fabrication, et un substrat de spectrométrie Raman exaltée de surface le comprenant. La présente invention concerne un substrat de spectrométrie Raman, son procédé de fabrication, et un dispositif d'analyse ainsi qu'un procédé d'analyse le comprenant. La présente invention concerne un aptacapteur comprenant un substrat comprenant une pluralité de microrainures, et une nanostructure métallique fixée à une surface du substrat.
본 발명은 표면증강 라만 분광법에 사용되는 인버스 다공성 증착막, 이의 제조 방법 및 이를 포함하는 표면증강 라만 분광기판에 관한 것이다. 또한, 본 발명은 라만 분광 기판, 이의 제조 방법, 이를 포함하는 분석 장치 및 분석 방법에 관한 것이다. 또한, 본 발명은 압타 센서에 관한 것으로서, 상기 압타 센서는 복수개의 마이크로그루브들(microgrooves)을 포함하는 기판, 그리고 상기 기판의 표면에 고정된 금속 나노 구조체를 포함한다.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAOcvR19FMIDnB1DgnyD3b2D4hUCA51Cg4JcgxxVXD0c1FwDAhxDHb1C_YP4mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgZGBgaWhiYGpo6GxsSpAgAtyCYd</recordid><startdate>20200507</startdate><enddate>20200507</enddate><creator>YANG, Jae-Moon</creator><creator>KIM, Jung-Hoon</creator><scope>EVB</scope></search><sort><creationdate>20200507</creationdate><title>RAMAN SPECTROSCOPY SUBSTRATE AND APTASENSOR</title><author>YANG, Jae-Moon ; KIM, Jung-Hoon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2020091405A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; kor</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG, Jae-Moon</creatorcontrib><creatorcontrib>KIM, Jung-Hoon</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG, Jae-Moon</au><au>KIM, Jung-Hoon</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RAMAN SPECTROSCOPY SUBSTRATE AND APTASENSOR</title><date>2020-05-07</date><risdate>2020</risdate><abstract>The present invention relates to an inverse porous deposition film used for surface enhanced Raman spectroscopy, a method for manufacturing same, and a surface enhanced Raman spectroscopy substrate comprising same. The present invention relates to a Raman spectroscopy substrate, a method for manufacturing same, and an analysis device and analysis method comprising same. The present invention relates to an aptasensor comprising a substrate comprising a plurality of microgrooves, and a metal nanostructure fixed to a surface of the substrate.
La présente invention concerne un film de dépôt poreux inverse utile à une spectrométrie Raman exaltée de surface, son procédé de fabrication, et un substrat de spectrométrie Raman exaltée de surface le comprenant. La présente invention concerne un substrat de spectrométrie Raman, son procédé de fabrication, et un dispositif d'analyse ainsi qu'un procédé d'analyse le comprenant. La présente invention concerne un aptacapteur comprenant un substrat comprenant une pluralité de microrainures, et une nanostructure métallique fixée à une surface du substrat.
본 발명은 표면증강 라만 분광법에 사용되는 인버스 다공성 증착막, 이의 제조 방법 및 이를 포함하는 표면증강 라만 분광기판에 관한 것이다. 또한, 본 발명은 라만 분광 기판, 이의 제조 방법, 이를 포함하는 분석 장치 및 분석 방법에 관한 것이다. 또한, 본 발명은 압타 센서에 관한 것으로서, 상기 압타 센서는 복수개의 마이크로그루브들(microgrooves)을 포함하는 기판, 그리고 상기 기판의 표면에 고정된 금속 나노 구조체를 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING |
| title | RAMAN SPECTROSCOPY SUBSTRATE AND APTASENSOR |
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