SOLID STATE IMAGE SENSOR

Provided is a solid state image sensor comprising: a photelectric converter that performs photoelectric conversion in response to incident light; a microlens for focusing the incident light on the photoelectric converter; and a cured film that is formed, on the microlens, from a radiation-sensitive...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: NARUKO Akito, KUDOU Kazunari
Format: Patent
Sprache:eng ; fre ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator NARUKO Akito
KUDOU Kazunari
description Provided is a solid state image sensor comprising: a photelectric converter that performs photoelectric conversion in response to incident light; a microlens for focusing the incident light on the photoelectric converter; and a cured film that is formed, on the microlens, from a radiation-sensitive composition containing a resin (A) having a silicon atom and an aromatic ring, and a radiation-sensitive compound (B). L'invention concerne un capteur d'image à semi-conducteurs comprenant : un convertisseur photoélectrique qui effectue une conversion photoélectrique en réponse à une lumière incidente ; une microlentille pour focaliser la lumière incidente sur le convertisseur photoélectrique ; et un film durci qui est formé, sur la microlentille, à partir d'une composition sensible au rayonnement contenant une résine (A), ayant un atome de silicium et un cycle aromatique, et un composé sensible au rayonnement (B). 入射光に応じて光電変換を行う光電変換部と、前記光電変換部に前記入射光を集めるマイクロレンズと、前記マイクロレンズ上の、ケイ素原子および芳香環を含む樹脂(A)と感放射線性化合物(B)とを含有する感放射線性組成物より形成された硬化膜とを有する固体撮像素子。
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2020066127A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2020066127A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2020066127A13</originalsourceid><addsrcrecordid>eNrjZJAI9vfxdFEIDnEMcVXw9HV0d1UIdvUL9g_iYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBkYGBmZmhkbmjobGxKkCAGb1IHw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SOLID STATE IMAGE SENSOR</title><source>esp@cenet</source><creator>NARUKO Akito ; KUDOU Kazunari</creator><creatorcontrib>NARUKO Akito ; KUDOU Kazunari</creatorcontrib><description>Provided is a solid state image sensor comprising: a photelectric converter that performs photoelectric conversion in response to incident light; a microlens for focusing the incident light on the photoelectric converter; and a cured film that is formed, on the microlens, from a radiation-sensitive composition containing a resin (A) having a silicon atom and an aromatic ring, and a radiation-sensitive compound (B). L'invention concerne un capteur d'image à semi-conducteurs comprenant : un convertisseur photoélectrique qui effectue une conversion photoélectrique en réponse à une lumière incidente ; une microlentille pour focaliser la lumière incidente sur le convertisseur photoélectrique ; et un film durci qui est formé, sur la microlentille, à partir d'une composition sensible au rayonnement contenant une résine (A), ayant un atome de silicium et un cycle aromatique, et un composé sensible au rayonnement (B). 入射光に応じて光電変換を行う光電変換部と、前記光電変換部に前記入射光を集めるマイクロレンズと、前記マイクロレンズ上の、ケイ素原子および芳香環を含む樹脂(A)と感放射線性化合物(B)とを含有する感放射線性組成物より形成された硬化膜とを有する固体撮像素子。</description><language>eng ; fre ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200402&amp;DB=EPODOC&amp;CC=WO&amp;NR=2020066127A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200402&amp;DB=EPODOC&amp;CC=WO&amp;NR=2020066127A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NARUKO Akito</creatorcontrib><creatorcontrib>KUDOU Kazunari</creatorcontrib><title>SOLID STATE IMAGE SENSOR</title><description>Provided is a solid state image sensor comprising: a photelectric converter that performs photoelectric conversion in response to incident light; a microlens for focusing the incident light on the photoelectric converter; and a cured film that is formed, on the microlens, from a radiation-sensitive composition containing a resin (A) having a silicon atom and an aromatic ring, and a radiation-sensitive compound (B). L'invention concerne un capteur d'image à semi-conducteurs comprenant : un convertisseur photoélectrique qui effectue une conversion photoélectrique en réponse à une lumière incidente ; une microlentille pour focaliser la lumière incidente sur le convertisseur photoélectrique ; et un film durci qui est formé, sur la microlentille, à partir d'une composition sensible au rayonnement contenant une résine (A), ayant un atome de silicium et un cycle aromatique, et un composé sensible au rayonnement (B). 入射光に応じて光電変換を行う光電変換部と、前記光電変換部に前記入射光を集めるマイクロレンズと、前記マイクロレンズ上の、ケイ素原子および芳香環を含む樹脂(A)と感放射線性化合物(B)とを含有する感放射線性組成物より形成された硬化膜とを有する固体撮像素子。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAI9vfxdFEIDnEMcVXw9HV0d1UIdvUL9g_iYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBkYGBmZmhkbmjobGxKkCAGb1IHw</recordid><startdate>20200402</startdate><enddate>20200402</enddate><creator>NARUKO Akito</creator><creator>KUDOU Kazunari</creator><scope>EVB</scope></search><sort><creationdate>20200402</creationdate><title>SOLID STATE IMAGE SENSOR</title><author>NARUKO Akito ; KUDOU Kazunari</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2020066127A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; jpn</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>NARUKO Akito</creatorcontrib><creatorcontrib>KUDOU Kazunari</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NARUKO Akito</au><au>KUDOU Kazunari</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SOLID STATE IMAGE SENSOR</title><date>2020-04-02</date><risdate>2020</risdate><abstract>Provided is a solid state image sensor comprising: a photelectric converter that performs photoelectric conversion in response to incident light; a microlens for focusing the incident light on the photoelectric converter; and a cured film that is formed, on the microlens, from a radiation-sensitive composition containing a resin (A) having a silicon atom and an aromatic ring, and a radiation-sensitive compound (B). L'invention concerne un capteur d'image à semi-conducteurs comprenant : un convertisseur photoélectrique qui effectue une conversion photoélectrique en réponse à une lumière incidente ; une microlentille pour focaliser la lumière incidente sur le convertisseur photoélectrique ; et un film durci qui est formé, sur la microlentille, à partir d'une composition sensible au rayonnement contenant une résine (A), ayant un atome de silicium et un cycle aromatique, et un composé sensible au rayonnement (B). 入射光に応じて光電変換を行う光電変換部と、前記光電変換部に前記入射光を集めるマイクロレンズと、前記マイクロレンズ上の、ケイ素原子および芳香環を含む樹脂(A)と感放射線性化合物(B)とを含有する感放射線性組成物より形成された硬化膜とを有する固体撮像素子。</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; jpn
recordid cdi_epo_espacenet_WO2020066127A1
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title SOLID STATE IMAGE SENSOR
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T04%3A24%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NARUKO%20Akito&rft.date=2020-04-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2020066127A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true