TUNING PATTERNING APPARATUS BASED ON OPTICAL CHARACTERISTIC

Described herein is a method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BASELMANS, Johannes, SMEETS, Bart, KOLLER, Paulus, HEPP, Birgitt, KÖHLER, Carsten, BOUMA, Anita
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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