INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES
An inspection system (1) serves to qualify semiconductor structures.The inspection system has an ion beam source (2) for space-resolved exposition of the structures to be qualified with an ion beam (3). Further, a secondary ion detection device (12) including a mass spectrometer (13) is provided. Th...
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| creator | LEWIS, Brett MANTZ, Ulrich KÜHN, Wilhelm MCVEY, Shawn XIA, Deying |
| description | An inspection system (1) serves to qualify semiconductor structures.The inspection system has an ion beam source (2) for space-resolved exposition of the structures to be qualified with an ion beam (3). Further, a secondary ion detection device (12) including a mass spectrometer (13) is provided. The mass spectrometer (13) is capable to measure an ion mass to charge ratio in a given bandwidth.
L'invention concerne un système d'inspection (1) qui sert à qualifier des structures semi-conductrices. Le système d'inspection a une source de faisceau d'ions (2) pour une exposition à résolution spatiale des structures à qualifier avec un faisceau d'ions (3). En outre, l'invention concerne un dispositif de détection d'ions secondaires (12) comprenant un spectromètre de masse (13). Le spectromètre de masse (13) est capable de mesurer un rapport masse ionique sur charge dans une largeur de bande donnée. |
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L'invention concerne un système d'inspection (1) qui sert à qualifier des structures semi-conductrices. Le système d'inspection a une source de faisceau d'ions (2) pour une exposition à résolution spatiale des structures à qualifier avec un faisceau d'ions (3). En outre, l'invention concerne un dispositif de détection d'ions secondaires (12) comprenant un spectromètre de masse (13). Le spectromètre de masse (13) est capable de mesurer un rapport masse ionique sur charge dans une largeur de bande donnée.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200102&DB=EPODOC&CC=WO&NR=2020001954A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200102&DB=EPODOC&CC=WO&NR=2020001954A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEWIS, Brett</creatorcontrib><creatorcontrib>MANTZ, Ulrich</creatorcontrib><creatorcontrib>KÜHN, Wilhelm</creatorcontrib><creatorcontrib>MCVEY, Shawn</creatorcontrib><creatorcontrib>XIA, Deying</creatorcontrib><title>INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES</title><description>An inspection system (1) serves to qualify semiconductor structures.The inspection system has an ion beam source (2) for space-resolved exposition of the structures to be qualified with an ion beam (3). Further, a secondary ion detection device (12) including a mass spectrometer (13) is provided. The mass spectrometer (13) is capable to measure an ion mass to charge ratio in a given bandwidth.
L'invention concerne un système d'inspection (1) qui sert à qualifier des structures semi-conductrices. Le système d'inspection a une source de faisceau d'ions (2) pour une exposition à résolution spatiale des structures à qualifier avec un faisceau d'ions (3). En outre, l'invention concerne un dispositif de détection d'ions secondaires (12) comprenant un spectromètre de masse (13). Le spectromètre de masse (13) est capable de mesurer un rapport masse ionique sur charge dans une largeur de bande donnée.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD29AsOcHUO8fT3UwiODA5x9VVw9HNRQBL1dQ3x8HdRCPFXCAx19PF0i1QIdvX1dPb3cwl1DvEPUggOCQIyQoNcg3kYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSXy4v5GBkYGBgaGlqYmjoTFxqgCZlS9C</recordid><startdate>20200102</startdate><enddate>20200102</enddate><creator>LEWIS, Brett</creator><creator>MANTZ, Ulrich</creator><creator>KÜHN, Wilhelm</creator><creator>MCVEY, Shawn</creator><creator>XIA, Deying</creator><scope>EVB</scope></search><sort><creationdate>20200102</creationdate><title>INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES</title><author>LEWIS, Brett ; MANTZ, Ulrich ; KÜHN, Wilhelm ; MCVEY, Shawn ; XIA, Deying</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2020001954A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>LEWIS, Brett</creatorcontrib><creatorcontrib>MANTZ, Ulrich</creatorcontrib><creatorcontrib>KÜHN, Wilhelm</creatorcontrib><creatorcontrib>MCVEY, Shawn</creatorcontrib><creatorcontrib>XIA, Deying</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEWIS, Brett</au><au>MANTZ, Ulrich</au><au>KÜHN, Wilhelm</au><au>MCVEY, Shawn</au><au>XIA, Deying</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES</title><date>2020-01-02</date><risdate>2020</risdate><abstract>An inspection system (1) serves to qualify semiconductor structures.The inspection system has an ion beam source (2) for space-resolved exposition of the structures to be qualified with an ion beam (3). Further, a secondary ion detection device (12) including a mass spectrometer (13) is provided. The mass spectrometer (13) is capable to measure an ion mass to charge ratio in a given bandwidth.
L'invention concerne un système d'inspection (1) qui sert à qualifier des structures semi-conductrices. Le système d'inspection a une source de faisceau d'ions (2) pour une exposition à résolution spatiale des structures à qualifier avec un faisceau d'ions (3). En outre, l'invention concerne un dispositif de détection d'ions secondaires (12) comprenant un spectromètre de masse (13). Le spectromètre de masse (13) est capable de mesurer un rapport masse ionique sur charge dans une largeur de bande donnée.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES |
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