A LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE

A device manufacturing method comprising: confining a liquid to an immersion space between a projection system and a facing surface of an object on a support table and/or the support table using a liquid confinement structure; starting application of an underpressure to an extraction unit to remove...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KOX, Ronald, BLOKS, Ruud, HOEFNAGELS, Pieter, NEEFS, Patricius, MELMAN, Johannes, BOMBEECK, John
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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