METHODS & APPARATUS FOR HIGH PRESSURE CURE OF FLOWABLE DIELECTRIC FILMS

A high-pressure dielectric film curing apparatus, such as a high-pressure batch furnace, is controlled to an elevated cure temperature and super-atmospheric pressure for the duration of the film curing time with the cure pressure achieved at least partially with a vapor of aqueous ammonia in fluid c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KILLAMPALLI, Aravind S, BYERS, Chad, GUPTA, Jay P, LEONARD, Jonathan E
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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