METHOD AND APPARATUS TO MONITOR A PROCESS APPARATUS

A substrate, including a substrate layer; and an etchable layer on the substrate layer, the etchable layer including a patterned region thereon or therein and including a blank region of sufficient size to enable a bulk etch rate of an etch tool for etching the blank region to be determined. L'...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TEN BERGE, Peter, GEMMINK, Jan-Willem, REIJNEN, Liesbeth, MULKENS, Johannes, Catharinus, Hubertus, VAN DE MAST, Franciscus, MASLOW, Mark, John
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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