SYSTEMS, METHODS AND DEVICES FOR ETCHING CONTROL
Layers of materials enriched with chemical isotopes can delineate boundaries between materials in a semiconductor process. During an etch process, these boundary layers are removed by chemical reactions, giving rise to volatile reaction products. By using a mass spectrometer attached to the etch cha...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!