SYSTEMS AND METHODS TO AVOID INSTABILITY CONDITIONS IN A SOURCE PLASMA CHAMBER

In LPP EUV systems, sinusoidal oscillations or instabilities can occur m the generated EUV energy. This is avoided by detecting when the LPP EUV system is approaching such instability and adjusting the LPP EUV system by moving the laser beam of the LPP EUV sysiem. Detection is done by determining wh...

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Bibliographische Detailangaben
1. Verfasser: RIGGS, Daniel, Jason
Format: Patent
Sprache:eng ; fre
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