A METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY

A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the supporting substrate comprises an inner region and a first border...

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Bibliographische Detailangaben
Hauptverfasser:	OOSTERHOFF, Sicco, JANSSEN, Paul, VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TRANSPORTING
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Beschreibung
Zusammenfassung:	A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the supporting substrate comprises an inner region and a first border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane (45) formed from at least the membrane layer; and a support (81) holding the membrane, the support formed at least partially from the first border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack. L'invention concerne un procédé de fabrication d'un ensemble membrane (80) de lithographie EUV, le procédé consistant à : utiliser un empilement (40) comprenant une couche de membrane (45) située entre un substrat de support (41) et un substrat de fixation (51), le substrat de support comprenant une région intérieure et une première région de bordure ; traiter l'empilement, y compris retirer sélectivement la région intérieure du substrat de support, pour former un ensemble membrane comprenant : une membrane (45) formée à partir d'au moins la couche de membrane ; et un support (81) maintenant la membrane, le support étant formé au moins partiellement à partir de la première région de bordure du substrat de support. Le substrat de fixation peut être lié au reste de l'empilement.