METHOD FOR MANUFACTURING ANTI-REFLECTIVE SURFACE USING PLASMA ETCHING, AND SUBSTRATE HAVING ANTI-REFLECTIVE SURFACE FORMED THEREON

METHOD FOR MANUFACTURING ANTI-REFLECTIVE SURFACE USING PLASMA ETCHING, AND SUBSTRATE HAVING ANTI-REFLECTIVE SURFACE FORMED THEREON

The present invention relates to a method for manufacturing an anti-reflective surface, which controls an anti-reflective structure layer, which is formed through repeated controls of plasma dry etching and inorganic deposition, with various structures, and can thus enhance durability and secure exc...

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Hauptverfasser: KIM, Joung Rae, CHOI, Byeong Gyeong, KIM, Hyun Joong, KIM, Hong Chul, WANG, Hong Rae, SHIN, Dong Hyun, KWON, Ah Hyun, RHA, Jong Joo, KWON, Jung Dae, LEE, Sung Do
Format: Patent
Sprache:eng ; fre ; kor
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator KIM, Joung Rae
CHOI, Byeong Gyeong
KIM, Hyun Joong
KIM, Hong Chul
WANG, Hong Rae
SHIN, Dong Hyun
KWON, Ah Hyun
RHA, Jong Joo
KWON, Jung Dae
LEE, Sung Do
description The present invention relates to a method for manufacturing an anti-reflective surface, which controls an anti-reflective structure layer, which is formed through repeated controls of plasma dry etching and inorganic deposition, with various structures, and can thus enhance durability and secure excellent light transmittance and anti-reflection effect while imparting functionalities such as easy cleaning, contamination resistance, scratch resistance, etc.; and to a substrate having an anti-reflective surface formed thereon. La présente invention concerne un procédé de fabrication d'une surface anti-réfléchissante, qui commande une couche de structure anti-réfléchissante, qui est formée par la répétition de commandes de gravure sèche par plasma et de dépôt inorganique, avec diverses structures, et peut ainsi améliorer la durabilité et garantir une excellente transmittance de la lumière et un excellent effet antireflet tout en conférant des fonctionnalités telles qu'un nettoyage facile, une résistance à la contamination, une résistance à la rayure, etc. ; et un substrat sur lequel est formée une surface antiréfléchissante. 본 발명은 플라즈마 건식 에칭과 무기물 증착의 반복적인 제어를 통해 형성되는 반사방지 구조층을 다양한 구조로 제어함으로써 내구성 향상과 우수한 광 투과성 및 반사방지 효과를 확보할 수 있고, 이지 클린, 내오염성, 내스크래치성 등과 같은 기능성을 부여할 수 있는 반사방지 표면의 제조 방법 및 반사방지 표면이 형성된 기판에 관한 것이다.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title METHOD FOR MANUFACTURING ANTI-REFLECTIVE SURFACE USING PLASMA ETCHING, AND SUBSTRATE HAVING ANTI-REFLECTIVE SURFACE FORMED THEREON
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