SYSTEM AND METHOD FOR FOCUS DETERMINATION USING FOCUS-SENSITIVE OVERLAY TARGETS

A lithography mask is disclosed. The lithography mask includes at least one asymmetric segmented pattern element. A particular asymmetric segmented pattern element includes at least two segments with a separation distance between consecutive segments smaller than a resolution of a set of projection...

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Bibliographische Detailangaben

1. Verfasser:	MIEHER, Walter
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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