METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER
The invention relates to a method for generating a predetermined three-dimensional contour of a component and/or a wafer, comprising: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculati...
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| creator | GEH, BERND DMITRIEV, VLADIMIR |
| description | The invention relates to a method for generating a predetermined three-dimensional contour of a component and/or a wafer, comprising: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.
L'invention concerne un procédé pour générer un contour tridimensionnel prédéfini d'un composant et/ou d'une tranche, comprenant les étapes consistant à : (a) déterminer un écart d'un contour tridimensionnel existant du composant et/ou de la plaquette à partir du contour tridimensionnel prédéfini; (b) calculer au moins un agencement tridimensionnel d'impulsions laser ayant un ou plusieurs ensembles de paramètres définissant les impulsions laser pour corriger l'écart existant déterminé du contour tridimensionnel à partir du contour tridimensionnel prédéfini; et (c) appliquer le ou les agencements tridimensionnels calculés d'impulsions laser sur le composant et/ou la plaquette pour générer le contour tridimensionnel prédéfini. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2015144700A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2015144700A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2015144700A23</originalsourceid><addsrcrecordid>eNqNjMEKwjAQRHvxIOo_LHgutlXxvDSbNmB3Q5rSYykST6KF9v8xih_gYRjmMbx1sjTka1GAHGMtOvRdC1ocVMQUl-EKEKwjRZ5cY5gU-NoRpco0xK0RxiuUwl46B6KjCcR6U35pY4WJ_Ud_iE6EHjW5bbK6j4857H69SfaafFmnYXoNYZ7GW3iGZeilyPJzfjpdsgyL43-vN3DwOXQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER</title><source>esp@cenet</source><creator>GEH, BERND ; DMITRIEV, VLADIMIR</creator><creatorcontrib>GEH, BERND ; DMITRIEV, VLADIMIR</creatorcontrib><description>The invention relates to a method for generating a predetermined three-dimensional contour of a component and/or a wafer, comprising: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.
L'invention concerne un procédé pour générer un contour tridimensionnel prédéfini d'un composant et/ou d'une tranche, comprenant les étapes consistant à : (a) déterminer un écart d'un contour tridimensionnel existant du composant et/ou de la plaquette à partir du contour tridimensionnel prédéfini; (b) calculer au moins un agencement tridimensionnel d'impulsions laser ayant un ou plusieurs ensembles de paramètres définissant les impulsions laser pour corriger l'écart existant déterminé du contour tridimensionnel à partir du contour tridimensionnel prédéfini; et (c) appliquer le ou les agencements tridimensionnels calculés d'impulsions laser sur le composant et/ou la plaquette pour générer le contour tridimensionnel prédéfini.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; IRRADIATION DEVICES ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MATERIALS THEREFOR ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; NANOTECHNOLOGY ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR ; TRANSPORTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151001&DB=EPODOC&CC=WO&NR=2015144700A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151001&DB=EPODOC&CC=WO&NR=2015144700A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GEH, BERND</creatorcontrib><creatorcontrib>DMITRIEV, VLADIMIR</creatorcontrib><title>METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER</title><description>The invention relates to a method for generating a predetermined three-dimensional contour of a component and/or a wafer, comprising: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.
L'invention concerne un procédé pour générer un contour tridimensionnel prédéfini d'un composant et/ou d'une tranche, comprenant les étapes consistant à : (a) déterminer un écart d'un contour tridimensionnel existant du composant et/ou de la plaquette à partir du contour tridimensionnel prédéfini; (b) calculer au moins un agencement tridimensionnel d'impulsions laser ayant un ou plusieurs ensembles de paramètres définissant les impulsions laser pour corriger l'écart existant déterminé du contour tridimensionnel à partir du contour tridimensionnel prédéfini; et (c) appliquer le ou les agencements tridimensionnels calculés d'impulsions laser sur le composant et/ou la plaquette pour générer le contour tridimensionnel prédéfini.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>HOLOGRAPHY</subject><subject>IRRADIATION DEVICES</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>NANOTECHNOLOGY</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjMEKwjAQRHvxIOo_LHgutlXxvDSbNmB3Q5rSYykST6KF9v8xih_gYRjmMbx1sjTka1GAHGMtOvRdC1ocVMQUl-EKEKwjRZ5cY5gU-NoRpco0xK0RxiuUwl46B6KjCcR6U35pY4WJ_Ud_iE6EHjW5bbK6j4857H69SfaafFmnYXoNYZ7GW3iGZeilyPJzfjpdsgyL43-vN3DwOXQ</recordid><startdate>20151001</startdate><enddate>20151001</enddate><creator>GEH, BERND</creator><creator>DMITRIEV, VLADIMIR</creator><scope>EVB</scope></search><sort><creationdate>20151001</creationdate><title>METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER</title><author>GEH, BERND ; DMITRIEV, VLADIMIR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2015144700A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>HOLOGRAPHY</topic><topic>IRRADIATION DEVICES</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>NANOTECHNOLOGY</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>GEH, BERND</creatorcontrib><creatorcontrib>DMITRIEV, VLADIMIR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GEH, BERND</au><au>DMITRIEV, VLADIMIR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER</title><date>2015-10-01</date><risdate>2015</risdate><abstract>The invention relates to a method for generating a predetermined three-dimensional contour of a component and/or a wafer, comprising: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.
L'invention concerne un procédé pour générer un contour tridimensionnel prédéfini d'un composant et/ou d'une tranche, comprenant les étapes consistant à : (a) déterminer un écart d'un contour tridimensionnel existant du composant et/ou de la plaquette à partir du contour tridimensionnel prédéfini; (b) calculer au moins un agencement tridimensionnel d'impulsions laser ayant un ou plusieurs ensembles de paramètres définissant les impulsions laser pour corriger l'écart existant déterminé du contour tridimensionnel à partir du contour tridimensionnel prédéfini; et (c) appliquer le ou les agencements tridimensionnels calculés d'impulsions laser sur le composant et/ou la plaquette pour générer le contour tridimensionnel prédéfini.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TRANSPORTING |
| title | METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER |
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