RADIATION SOURCE

The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic elec...

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Hauptverfasser: DONKER, RILPHO, LUDOVICUS, BARTRAIJ, PETRUS, RUTGERUS, AKKERMANS, JOHANNES, ANTONIUS, GERARDUS, LOOPSTRA, ERIK, ROELOF, BANINE, VADIM, YEVGENYEVICH
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creator DONKER, RILPHO, LUDOVICUS
BARTRAIJ, PETRUS, RUTGERUS
AKKERMANS, JOHANNES, ANTONIUS, GERARDUS
LOOPSTRA, ERIK, ROELOF
BANINE, VADIM, YEVGENYEVICH
description The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another. La présente invention concerne un laser à électrons libres. Le laser à électrons libres comprend une source d'électrons permettant d'émettre un faisceau d'électrons, un accélérateur de particules permettant d'accélérer le faisceau d'électrons à des énergies relativistes, un ondulateur permettant de guider le faisceau d'électrons relativistes le long d'un trajet périodique de façon à permettre l'émission d'un rayonnement cohérent et une unité de direction permettant de modifier la trajectoire du faisceau d'électrons de manière à diriger le faisceau d'électrons d'un premier trajet le long duquel le faisceau d'électrons se propage sensiblement dans une première direction à un second trajet le long duquel le faisceau d'électrons se propage sensiblement dans une seconde direction, le premier trajet et le second trajet étant verticalement séparés l'un de l'autre.
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The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another. La présente invention concerne un laser à électrons libres. Le laser à électrons libres comprend une source d'électrons permettant d'émettre un faisceau d'électrons, un accélérateur de particules permettant d'accélérer le faisceau d'électrons à des énergies relativistes, un ondulateur permettant de guider le faisceau d'électrons relativistes le long d'un trajet périodique de façon à permettre l'émission d'un rayonnement cohérent et une unité de direction permettant de modifier la trajectoire du faisceau d'électrons de manière à diriger le faisceau d'électrons d'un premier trajet le long duquel le faisceau d'électrons se propage sensiblement dans une première direction à un second trajet le long duquel le faisceau d'électrons se propage sensiblement dans une seconde direction, le premier trajet et le second trajet étant verticalement séparés l'un de l'autre.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DEVICES USING STIMULATED EMISSION
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
title RADIATION SOURCE
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