RADIATION SOURCE
The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic elec...
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creator | DONKER, RILPHO, LUDOVICUS BARTRAIJ, PETRUS, RUTGERUS AKKERMANS, JOHANNES, ANTONIUS, GERARDUS LOOPSTRA, ERIK, ROELOF BANINE, VADIM, YEVGENYEVICH |
description | The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another.
La présente invention concerne un laser à électrons libres. Le laser à électrons libres comprend une source d'électrons permettant d'émettre un faisceau d'électrons, un accélérateur de particules permettant d'accélérer le faisceau d'électrons à des énergies relativistes, un ondulateur permettant de guider le faisceau d'électrons relativistes le long d'un trajet périodique de façon à permettre l'émission d'un rayonnement cohérent et une unité de direction permettant de modifier la trajectoire du faisceau d'électrons de manière à diriger le faisceau d'électrons d'un premier trajet le long duquel le faisceau d'électrons se propage sensiblement dans une première direction à un second trajet le long duquel le faisceau d'électrons se propage sensiblement dans une seconde direction, le premier trajet et le second trajet étant verticalement séparés l'un de l'autre. |
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La présente invention concerne un laser à électrons libres. Le laser à électrons libres comprend une source d'électrons permettant d'émettre un faisceau d'électrons, un accélérateur de particules permettant d'accélérer le faisceau d'électrons à des énergies relativistes, un ondulateur permettant de guider le faisceau d'électrons relativistes le long d'un trajet périodique de façon à permettre l'émission d'un rayonnement cohérent et une unité de direction permettant de modifier la trajectoire du faisceau d'électrons de manière à diriger le faisceau d'électrons d'un premier trajet le long duquel le faisceau d'électrons se propage sensiblement dans une première direction à un second trajet le long duquel le faisceau d'électrons se propage sensiblement dans une seconde direction, le premier trajet et le second trajet étant verticalement séparés l'un de l'autre.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150917&DB=EPODOC&CC=WO&NR=2015135912A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150917&DB=EPODOC&CC=WO&NR=2015135912A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DONKER, RILPHO, LUDOVICUS</creatorcontrib><creatorcontrib>BARTRAIJ, PETRUS, RUTGERUS</creatorcontrib><creatorcontrib>AKKERMANS, JOHANNES, ANTONIUS, GERARDUS</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK, ROELOF</creatorcontrib><creatorcontrib>BANINE, VADIM, YEVGENYEVICH</creatorcontrib><title>RADIATION SOURCE</title><description>The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another.
La présente invention concerne un laser à électrons libres. Le laser à électrons libres comprend une source d'électrons permettant d'émettre un faisceau d'électrons, un accélérateur de particules permettant d'accélérer le faisceau d'électrons à des énergies relativistes, un ondulateur permettant de guider le faisceau d'électrons relativistes le long d'un trajet périodique de façon à permettre l'émission d'un rayonnement cohérent et une unité de direction permettant de modifier la trajectoire du faisceau d'électrons de manière à diriger le faisceau d'électrons d'un premier trajet le long duquel le faisceau d'électrons se propage sensiblement dans une première direction à un second trajet le long duquel le faisceau d'électrons se propage sensiblement dans une seconde direction, le premier trajet et le second trajet étant verticalement séparés l'un de l'autre.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAIcnTxdAzx9PdTCPYPDXJ25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgaGpobGppaGRo5GxsSpAgB7Gx5v</recordid><startdate>20150917</startdate><enddate>20150917</enddate><creator>DONKER, RILPHO, LUDOVICUS</creator><creator>BARTRAIJ, PETRUS, RUTGERUS</creator><creator>AKKERMANS, JOHANNES, ANTONIUS, GERARDUS</creator><creator>LOOPSTRA, ERIK, ROELOF</creator><creator>BANINE, VADIM, YEVGENYEVICH</creator><scope>EVB</scope></search><sort><creationdate>20150917</creationdate><title>RADIATION SOURCE</title><author>DONKER, RILPHO, LUDOVICUS ; BARTRAIJ, PETRUS, RUTGERUS ; AKKERMANS, JOHANNES, ANTONIUS, GERARDUS ; LOOPSTRA, ERIK, ROELOF ; BANINE, VADIM, YEVGENYEVICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2015135912A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>DONKER, RILPHO, LUDOVICUS</creatorcontrib><creatorcontrib>BARTRAIJ, PETRUS, RUTGERUS</creatorcontrib><creatorcontrib>AKKERMANS, JOHANNES, ANTONIUS, GERARDUS</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK, ROELOF</creatorcontrib><creatorcontrib>BANINE, VADIM, YEVGENYEVICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DONKER, RILPHO, LUDOVICUS</au><au>BARTRAIJ, PETRUS, RUTGERUS</au><au>AKKERMANS, JOHANNES, ANTONIUS, GERARDUS</au><au>LOOPSTRA, ERIK, ROELOF</au><au>BANINE, VADIM, YEVGENYEVICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RADIATION SOURCE</title><date>2015-09-17</date><risdate>2015</risdate><abstract>The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another.
La présente invention concerne un laser à électrons libres. Le laser à électrons libres comprend une source d'électrons permettant d'émettre un faisceau d'électrons, un accélérateur de particules permettant d'accélérer le faisceau d'électrons à des énergies relativistes, un ondulateur permettant de guider le faisceau d'électrons relativistes le long d'un trajet périodique de façon à permettre l'émission d'un rayonnement cohérent et une unité de direction permettant de modifier la trajectoire du faisceau d'électrons de manière à diriger le faisceau d'électrons d'un premier trajet le long duquel le faisceau d'électrons se propage sensiblement dans une première direction à un second trajet le long duquel le faisceau d'électrons se propage sensiblement dans une seconde direction, le premier trajet et le second trajet étant verticalement séparés l'un de l'autre.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS |
title | RADIATION SOURCE |
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