STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM
A stage system including a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the...
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| creator | WESTERLAKEN, JAN, STEVEN, CHRISTIAAN BEERENS, RUUD, ANTONIUS, CATHARINA, MARIA RUTTEN, ROB, JOHAN, THEODOOR ZAAL, KOEN, JACOBUS, JOHANNES, MARIA VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS |
| description | A stage system including a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
L'invention concerne un système de plate-forme comprenant une plate-forme mobile, et un code pour mesurer une position de la plate-forme. Le codeur comprend un émetteur pour émettre un faisceau codeur, une grille pour interagir avec le faisceau codeur, et un détecteur pour détecter le faisceau codeur ayant interagi avec la grille, le faisceau codeur en cours d'utilisation se propageant le long d'un chemin optique ; un capuchon de purge fermant au moins partiellement le chemin optique ; et un dispositif de fourniture de substance de purge pour fournir une substance de purge dans le capuchon de purge. |
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L'invention concerne un système de plate-forme comprenant une plate-forme mobile, et un code pour mesurer une position de la plate-forme. Le codeur comprend un émetteur pour émettre un faisceau codeur, une grille pour interagir avec le faisceau codeur, et un détecteur pour détecter le faisceau codeur ayant interagi avec la grille, le faisceau codeur en cours d'utilisation se propageant le long d'un chemin optique ; un capuchon de purge fermant au moins partiellement le chemin optique ; et un dispositif de fourniture de substance de purge pour fournir une substance de purge dans le capuchon de purge.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; MEASURING ; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE ; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TARIFF METERING APPARATUS ; TESTING</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140327&DB=EPODOC&CC=WO&NR=2014044477A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140327&DB=EPODOC&CC=WO&NR=2014044477A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WESTERLAKEN, JAN, STEVEN, CHRISTIAAN</creatorcontrib><creatorcontrib>BEERENS, RUUD, ANTONIUS, CATHARINA, MARIA</creatorcontrib><creatorcontrib>RUTTEN, ROB, JOHAN, THEODOOR</creatorcontrib><creatorcontrib>ZAAL, KOEN, JACOBUS, JOHANNES, MARIA</creatorcontrib><creatorcontrib>VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS</creatorcontrib><creatorcontrib>VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS</creatorcontrib><title>STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM</title><description>A stage system including a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
L'invention concerne un système de plate-forme comprenant une plate-forme mobile, et un code pour mesurer une position de la plate-forme. Le codeur comprend un émetteur pour émettre un faisceau codeur, une grille pour interagir avec le faisceau codeur, et un détecteur pour détecter le faisceau codeur ayant interagi avec la grille, le faisceau codeur en cours d'utilisation se propageant le long d'un chemin optique ; un capuchon de purge fermant au moins partiellement le chemin optique ; et un dispositif de fourniture de substance de purge pour fournir une substance de purge dans le capuchon de purge.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</subject><subject>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TARIFF METERING APPARATUS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAJDnF0d1UIjgwOcfVVcPRzUfDxDPHwdw9yDPDwdFZwDAhwDHIMCQ1WcPb3DQjyDPb0c1cIDnX2UEDWx8PAmpaYU5zKC6W5GZTdXEOcPXRTC_LjU4sLEpNT81JL4sP9jQwMTQxMTEzMzR0NjYlTBQArDCz_</recordid><startdate>20140327</startdate><enddate>20140327</enddate><creator>WESTERLAKEN, JAN, STEVEN, CHRISTIAAN</creator><creator>BEERENS, RUUD, ANTONIUS, CATHARINA, MARIA</creator><creator>RUTTEN, ROB, JOHAN, THEODOOR</creator><creator>ZAAL, KOEN, JACOBUS, JOHANNES, MARIA</creator><creator>VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS</creator><creator>VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS</creator><scope>EVB</scope></search><sort><creationdate>20140327</creationdate><title>STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM</title><author>WESTERLAKEN, JAN, STEVEN, CHRISTIAAN ; BEERENS, RUUD, ANTONIUS, CATHARINA, MARIA ; RUTTEN, ROB, JOHAN, THEODOOR ; ZAAL, KOEN, JACOBUS, JOHANNES, MARIA ; VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS ; VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2014044477A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</topic><topic>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TARIFF METERING APPARATUS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>WESTERLAKEN, JAN, STEVEN, CHRISTIAAN</creatorcontrib><creatorcontrib>BEERENS, RUUD, ANTONIUS, CATHARINA, MARIA</creatorcontrib><creatorcontrib>RUTTEN, ROB, JOHAN, THEODOOR</creatorcontrib><creatorcontrib>ZAAL, KOEN, JACOBUS, JOHANNES, MARIA</creatorcontrib><creatorcontrib>VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS</creatorcontrib><creatorcontrib>VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WESTERLAKEN, JAN, STEVEN, CHRISTIAAN</au><au>BEERENS, RUUD, ANTONIUS, CATHARINA, MARIA</au><au>RUTTEN, ROB, JOHAN, THEODOOR</au><au>ZAAL, KOEN, JACOBUS, JOHANNES, MARIA</au><au>VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS</au><au>VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM</title><date>2014-03-27</date><risdate>2014</risdate><abstract>A stage system including a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
L'invention concerne un système de plate-forme comprenant une plate-forme mobile, et un code pour mesurer une position de la plate-forme. Le codeur comprend un émetteur pour émettre un faisceau codeur, une grille pour interagir avec le faisceau codeur, et un détecteur pour détecter le faisceau codeur ayant interagi avec la grille, le faisceau codeur en cours d'utilisation se propageant le long d'un chemin optique ; un capuchon de purge fermant au moins partiellement le chemin optique ; et un dispositif de fourniture de substance de purge pour fournir une substance de purge dans le capuchon de purge.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TARIFF METERING APPARATUS TESTING |
| title | STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM |
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