NANO-SCALE VOID REDUCTION

Resist imprinting void reduction method may include sealing a chamber. The chamber may be filled with an ambient inert gas, wherein the inert gas a solubility in a resist layer on a substrate greater than Helium. The method may also include establishing a pressure within the chamber sufficient to ca...

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Bibliographische Detailangaben

Hauptverfasser:	HWU, JUSTIN JIA-JEN, GAUZNER, GENNADY, GREENBERG, THOMAS LARSON
Format:	Patent
Sprache:	eng ; fre
Online-Zugang:	Volltext bestellen
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