FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
Provided are a field effect transistor and a manufacturing method thereof. The field effect transistor includes: a substrate (101); a source (S) and a drain (D), one of which is formed on a bulge (100) on the upper surface of the substrate (101), and the other in the substrate (101) at the bottom of...
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Hauptverfasser: | , , , |
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Format: | Patent |
Sprache: | chi ; eng ; fre |
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