TRANSMISSION LINE RF APPLICATOR FOR PLASMA CHAMBER
A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between...
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| creator | WHITE, JOHN, M TANAKA, TSUTOMU SHINDE, RANJIT, INDRAJIT SORENSEN, CARL, A KUDELA, JOZEF CHO, SEON-MEE ANWAR, SUHAIL TRUONG, DOUGLAS, D |
| description | A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.
L'invention concerne un appareil et un procédé d'applicateur RF de ligne de transmission destinés à coupler une puissance RF à un plasma dans une chambre plasma. L'appareil comprend un conducteur intérieur et un ou deux conducteurs extérieurs. La partie principale du ou de chacun des deux conducteurs extérieurs comprend une pluralité d'ouvertures qui s'étendent entre une surface intérieure et une surface extérieure du conducteur extérieur. |
| format | Patent |
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L'invention concerne un appareil et un procédé d'applicateur RF de ligne de transmission destinés à coupler une puissance RF à un plasma dans une chambre plasma. L'appareil comprend un conducteur intérieur et un ou deux conducteurs extérieurs. La partie principale du ou de chacun des deux conducteurs extérieurs comprend une pluralité d'ouvertures qui s'étendent entre une surface intérieure et une surface extérieure du conducteur extérieur.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>WAVEGUIDES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAKCXL0C_b1DA729PdT8PH0c1UIclNwDAjw8XR2DPEPUnAD4gAfx2BfRwVnD0dfJ9cgHgbWtMSc4lReKM3NoOzmGuLsoZtakB-fWlyQmJyal1oSH-5vZGBoZGhubmRp7GhkTJwqABiVJ78</recordid><startdate>20121227</startdate><enddate>20121227</enddate><creator>WHITE, JOHN, M</creator><creator>TANAKA, TSUTOMU</creator><creator>SHINDE, RANJIT, INDRAJIT</creator><creator>SORENSEN, CARL, A</creator><creator>KUDELA, JOZEF</creator><creator>CHO, SEON-MEE</creator><creator>ANWAR, SUHAIL</creator><creator>TRUONG, DOUGLAS, D</creator><scope>EVB</scope></search><sort><creationdate>20121227</creationdate><title>TRANSMISSION LINE RF APPLICATOR FOR PLASMA CHAMBER</title><author>WHITE, JOHN, M ; TANAKA, TSUTOMU ; SHINDE, RANJIT, INDRAJIT ; SORENSEN, CARL, A ; KUDELA, JOZEF ; CHO, SEON-MEE ; ANWAR, SUHAIL ; TRUONG, DOUGLAS, D</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2012177293A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2012</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>WAVEGUIDES</topic><toplevel>online_resources</toplevel><creatorcontrib>WHITE, JOHN, M</creatorcontrib><creatorcontrib>TANAKA, TSUTOMU</creatorcontrib><creatorcontrib>SHINDE, RANJIT, INDRAJIT</creatorcontrib><creatorcontrib>SORENSEN, CARL, A</creatorcontrib><creatorcontrib>KUDELA, JOZEF</creatorcontrib><creatorcontrib>CHO, SEON-MEE</creatorcontrib><creatorcontrib>ANWAR, SUHAIL</creatorcontrib><creatorcontrib>TRUONG, DOUGLAS, D</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WHITE, JOHN, M</au><au>TANAKA, TSUTOMU</au><au>SHINDE, RANJIT, INDRAJIT</au><au>SORENSEN, CARL, A</au><au>KUDELA, JOZEF</au><au>CHO, SEON-MEE</au><au>ANWAR, SUHAIL</au><au>TRUONG, DOUGLAS, D</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TRANSMISSION LINE RF APPLICATOR FOR PLASMA CHAMBER</title><date>2012-12-27</date><risdate>2012</risdate><abstract>A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.
L'invention concerne un appareil et un procédé d'applicateur RF de ligne de transmission destinés à coupler une puissance RF à un plasma dans une chambre plasma. L'appareil comprend un conducteur intérieur et un ou deux conducteurs extérieurs. La partie principale du ou de chacun des deux conducteurs extérieurs comprend une pluralité d'ouvertures qui s'étendent entre une surface intérieure et une surface extérieure du conducteur extérieur.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE SEMICONDUCTOR DEVICES WAVEGUIDES |
| title | TRANSMISSION LINE RF APPLICATOR FOR PLASMA CHAMBER |
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