EUV MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS WITH A HEAT LIGHT SOURCE

The invention relates to an EUV microlithography projection exposure apparatus having an exposure light source for producing radiation in a first spectral range from 5 nm - 15 nm a heat light source for producing radiation in a second spectral range from 1 -50 µm. The apparatus furthermore comprises...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	FIOLKA, DAMIAN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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