METHOD OF FORMING A DEVICE WITH A PIEZORESISTOR AND ACCELEROMETER

A method of forming a device with a piezoresistor is disclosed herein. In one embodiment, the method includes providing a substrate, etching a trench in the substrate to form a vertical wall, growing a piezoresistor layer epitaxially on the vertical wall, and separating the vertical wall from an und...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BARLIAN, ARNOLDUS, ALVIN, YAMA, GARY, PRUITT, BETH
Format: Patent
Sprache:eng ; fre
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator BARLIAN, ARNOLDUS, ALVIN
YAMA, GARY
PRUITT, BETH
description A method of forming a device with a piezoresistor is disclosed herein. In one embodiment, the method includes providing a substrate, etching a trench in the substrate to form a vertical wall, growing a piezoresistor layer epitaxially on the vertical wall, and separating the vertical wall from an underlying layer of the substrate that extends along a horizontal plane such that the piezoresistor layer is movable with respect to the underlying layer within the horizontal plane. La présente invention concerne un procédé de formation d'un dispositif avec une piézorésistance. Dans un mode de réalisation, le procédé consiste à réaliser un substrat, à graver une tranchée dans le substrat pour former une paroi verticale, à faire croître épitaxiquement une couche de piézorésistance sur la paroi verticale, et à séparer la paroi verticale d'une couche sous-jacente du substrat qui s'étend le long d'un plan horizontal de telle sorte que la couche de piézorésistance soit mobile par rapport à la couche sous-jacente dans le plan horizontal.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2010083158A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2010083158A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2010083158A13</originalsourceid><addsrcrecordid>eNrjZHD0dQ3x8HdR8HdTcPMP8vX0c1dwVHBxDfN0dlUI9wzxAPICPF2j_INcgz2DQ_yDFBz9XBQcnZ1dfVyD_IF6XYN4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8uL-RgaGBgYWxoamFo6ExcaoAWy8rlg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD OF FORMING A DEVICE WITH A PIEZORESISTOR AND ACCELEROMETER</title><source>esp@cenet</source><creator>BARLIAN, ARNOLDUS, ALVIN ; YAMA, GARY ; PRUITT, BETH</creator><creatorcontrib>BARLIAN, ARNOLDUS, ALVIN ; YAMA, GARY ; PRUITT, BETH</creatorcontrib><description>A method of forming a device with a piezoresistor is disclosed herein. In one embodiment, the method includes providing a substrate, etching a trench in the substrate to form a vertical wall, growing a piezoresistor layer epitaxially on the vertical wall, and separating the vertical wall from an underlying layer of the substrate that extends along a horizontal plane such that the piezoresistor layer is movable with respect to the underlying layer within the horizontal plane. La présente invention concerne un procédé de formation d'un dispositif avec une piézorésistance. Dans un mode de réalisation, le procédé consiste à réaliser un substrat, à graver une tranchée dans le substrat pour former une paroi verticale, à faire croître épitaxiquement une couche de piézorésistance sur la paroi verticale, et à séparer la paroi verticale d'une couche sous-jacente du substrat qui s'étend le long d'un plan horizontal de telle sorte que la couche de piézorésistance soit mobile par rapport à la couche sous-jacente dans le plan horizontal.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GYROSCOPIC INSTRUMENTS ; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT ; MEASURING ; MEASURING DISTANCES, LEVELS OR BEARINGS ; MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK ; NAVIGATION ; PHOTOGRAMMETRY OR VIDEOGRAMMETRY ; PHYSICS ; SEMICONDUCTOR DEVICES ; SURVEYING ; TESTING</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100722&amp;DB=EPODOC&amp;CC=WO&amp;NR=2010083158A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100722&amp;DB=EPODOC&amp;CC=WO&amp;NR=2010083158A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BARLIAN, ARNOLDUS, ALVIN</creatorcontrib><creatorcontrib>YAMA, GARY</creatorcontrib><creatorcontrib>PRUITT, BETH</creatorcontrib><title>METHOD OF FORMING A DEVICE WITH A PIEZORESISTOR AND ACCELEROMETER</title><description>A method of forming a device with a piezoresistor is disclosed herein. In one embodiment, the method includes providing a substrate, etching a trench in the substrate to form a vertical wall, growing a piezoresistor layer epitaxially on the vertical wall, and separating the vertical wall from an underlying layer of the substrate that extends along a horizontal plane such that the piezoresistor layer is movable with respect to the underlying layer within the horizontal plane. La présente invention concerne un procédé de formation d'un dispositif avec une piézorésistance. Dans un mode de réalisation, le procédé consiste à réaliser un substrat, à graver une tranchée dans le substrat pour former une paroi verticale, à faire croître épitaxiquement une couche de piézorésistance sur la paroi verticale, et à séparer la paroi verticale d'une couche sous-jacente du substrat qui s'étend le long d'un plan horizontal de telle sorte que la couche de piézorésistance soit mobile par rapport à la couche sous-jacente dans le plan horizontal.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GYROSCOPIC INSTRUMENTS</subject><subject>INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT</subject><subject>MEASURING</subject><subject>MEASURING DISTANCES, LEVELS OR BEARINGS</subject><subject>MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK</subject><subject>NAVIGATION</subject><subject>PHOTOGRAMMETRY OR VIDEOGRAMMETRY</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURVEYING</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD0dQ3x8HdR8HdTcPMP8vX0c1dwVHBxDfN0dlUI9wzxAPICPF2j_INcgz2DQ_yDFBz9XBQcnZ1dfVyD_IF6XYN4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8uL-RgaGBgYWxoamFo6ExcaoAWy8rlg</recordid><startdate>20100722</startdate><enddate>20100722</enddate><creator>BARLIAN, ARNOLDUS, ALVIN</creator><creator>YAMA, GARY</creator><creator>PRUITT, BETH</creator><scope>EVB</scope></search><sort><creationdate>20100722</creationdate><title>METHOD OF FORMING A DEVICE WITH A PIEZORESISTOR AND ACCELEROMETER</title><author>BARLIAN, ARNOLDUS, ALVIN ; YAMA, GARY ; PRUITT, BETH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2010083158A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2010</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GYROSCOPIC INSTRUMENTS</topic><topic>INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT</topic><topic>MEASURING</topic><topic>MEASURING DISTANCES, LEVELS OR BEARINGS</topic><topic>MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK</topic><topic>NAVIGATION</topic><topic>PHOTOGRAMMETRY OR VIDEOGRAMMETRY</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURVEYING</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BARLIAN, ARNOLDUS, ALVIN</creatorcontrib><creatorcontrib>YAMA, GARY</creatorcontrib><creatorcontrib>PRUITT, BETH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BARLIAN, ARNOLDUS, ALVIN</au><au>YAMA, GARY</au><au>PRUITT, BETH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF FORMING A DEVICE WITH A PIEZORESISTOR AND ACCELEROMETER</title><date>2010-07-22</date><risdate>2010</risdate><abstract>A method of forming a device with a piezoresistor is disclosed herein. In one embodiment, the method includes providing a substrate, etching a trench in the substrate to form a vertical wall, growing a piezoresistor layer epitaxially on the vertical wall, and separating the vertical wall from an underlying layer of the substrate that extends along a horizontal plane such that the piezoresistor layer is movable with respect to the underlying layer within the horizontal plane. La présente invention concerne un procédé de formation d'un dispositif avec une piézorésistance. Dans un mode de réalisation, le procédé consiste à réaliser un substrat, à graver une tranchée dans le substrat pour former une paroi verticale, à faire croître épitaxiquement une couche de piézorésistance sur la paroi verticale, et à séparer la paroi verticale d'une couche sous-jacente du substrat qui s'étend le long d'un plan horizontal de telle sorte que la couche de piézorésistance soit mobile par rapport à la couche sous-jacente dans le plan horizontal.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre
recordid cdi_epo_espacenet_WO2010083158A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GYROSCOPIC INSTRUMENTS
INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
MEASURING
MEASURING DISTANCES, LEVELS OR BEARINGS
MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK
NAVIGATION
PHOTOGRAMMETRY OR VIDEOGRAMMETRY
PHYSICS
SEMICONDUCTOR DEVICES
SURVEYING
TESTING
title METHOD OF FORMING A DEVICE WITH A PIEZORESISTOR AND ACCELEROMETER
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T06%3A28%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BARLIAN,%20ARNOLDUS,%20ALVIN&rft.date=2010-07-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2010083158A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true