PROCESS FOR DEPOSITING BORON COMPOUNDS BY CVD OR PVD
The present invention relates to a process for depositing films on a substrate by chemical vapour deposition (CVD) or physical vapour deposition (PVD), said process employing at least one boron compound. This process is particularly useful for fabricating photovoltaic solar cells. The invention also...
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| creator | JAHAN, DENIS PINCHART, AUDREY |
| description | The present invention relates to a process for depositing films on a substrate by chemical vapour deposition (CVD) or physical vapour deposition (PVD), said process employing at least one boron compound. This process is particularly useful for fabricating photovoltaic solar cells. The invention also relates to the use of boron compounds for conferring optical and/or electrical properties on materials in a CVD or PVD deposition process. This process is also particularly useful for fabricating a photovoltaic solar cell.
La présente invention concerne un procédé de dépôt par dépôt chimique en phase vapeur (CVD) ou par dépôt physique en phase vapeur (PVD) sur un support, ledit procédé mettant en oevre au moins un composé de bore. Ce procédé est particulièrement utile pour fabriquer des cellules solaires photovoltaïques. L'invention se rapporte également à l'utilisation de composés de bore pour conférer des propriétés optiques et/ou électriques à des matériaux dans un procédé de dépôt par CVD ou par PVD. Ce procédé est également particulièrement utile pour fabriquer une cellule solaire photovoltaïque. |
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La présente invention concerne un procédé de dépôt par dépôt chimique en phase vapeur (CVD) ou par dépôt physique en phase vapeur (PVD) sur un support, ledit procédé mettant en oevre au moins un composé de bore. Ce procédé est particulièrement utile pour fabriquer des cellules solaires photovoltaïques. L'invention se rapporte également à l'utilisation de composés de bore pour conférer des propriétés optiques et/ou électriques à des matériaux dans un procédé de dépôt par CVD ou par PVD. Ce procédé est également particulièrement utile pour fabriquer une cellule solaire photovoltaïque.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090604&DB=EPODOC&CC=WO&NR=2009068769A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090604&DB=EPODOC&CC=WO&NR=2009068769A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JAHAN, DENIS</creatorcontrib><creatorcontrib>PINCHART, AUDREY</creatorcontrib><title>PROCESS FOR DEPOSITING BORON COMPOUNDS BY CVD OR PVD</title><description>The present invention relates to a process for depositing films on a substrate by chemical vapour deposition (CVD) or physical vapour deposition (PVD), said process employing at least one boron compound. This process is particularly useful for fabricating photovoltaic solar cells. The invention also relates to the use of boron compounds for conferring optical and/or electrical properties on materials in a CVD or PVD deposition process. This process is also particularly useful for fabricating a photovoltaic solar cell.
La présente invention concerne un procédé de dépôt par dépôt chimique en phase vapeur (CVD) ou par dépôt physique en phase vapeur (PVD) sur un support, ledit procédé mettant en oevre au moins un composé de bore. Ce procédé est particulièrement utile pour fabriquer des cellules solaires photovoltaïques. L'invention se rapporte également à l'utilisation de composés de bore pour conférer des propriétés optiques et/ou électriques à des matériaux dans un procédé de dépôt par CVD ou par PVD. Ce procédé est également particulièrement utile pour fabriquer une cellule solaire photovoltaïque.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJCPJ3dg0OVnDzD1JwcQ3wD_YM8fRzV3DyD_L3U3D29w3wD_VzCVZwilRwDnNRACoKCHPhYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBgaWBmYW5maWjobGxKkCAGfrKGA</recordid><startdate>20090604</startdate><enddate>20090604</enddate><creator>JAHAN, DENIS</creator><creator>PINCHART, AUDREY</creator><scope>EVB</scope></search><sort><creationdate>20090604</creationdate><title>PROCESS FOR DEPOSITING BORON COMPOUNDS BY CVD OR PVD</title><author>JAHAN, DENIS ; PINCHART, AUDREY</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2009068769A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2009</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>JAHAN, DENIS</creatorcontrib><creatorcontrib>PINCHART, AUDREY</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JAHAN, DENIS</au><au>PINCHART, AUDREY</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESS FOR DEPOSITING BORON COMPOUNDS BY CVD OR PVD</title><date>2009-06-04</date><risdate>2009</risdate><abstract>The present invention relates to a process for depositing films on a substrate by chemical vapour deposition (CVD) or physical vapour deposition (PVD), said process employing at least one boron compound. This process is particularly useful for fabricating photovoltaic solar cells. The invention also relates to the use of boron compounds for conferring optical and/or electrical properties on materials in a CVD or PVD deposition process. This process is also particularly useful for fabricating a photovoltaic solar cell.
La présente invention concerne un procédé de dépôt par dépôt chimique en phase vapeur (CVD) ou par dépôt physique en phase vapeur (PVD) sur un support, ledit procédé mettant en oevre au moins un composé de bore. Ce procédé est particulièrement utile pour fabriquer des cellules solaires photovoltaïques. L'invention se rapporte également à l'utilisation de composés de bore pour conférer des propriétés optiques et/ou électriques à des matériaux dans un procédé de dépôt par CVD ou par PVD. Ce procédé est également particulièrement utile pour fabriquer une cellule solaire photovoltaïque.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PROCESS FOR DEPOSITING BORON COMPOUNDS BY CVD OR PVD |
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