A METHOD OF PATTERNING A HARD DISK MEDIUM
The invention relates to a method of patterning a hard disk medium, comprising the step of applying a lithographic process to a resistive top layer of the hard disk medium, wherein the resistive top layer is exposed to a beam having multiple electron or optical beamlets. Preferably, foci of the mult...
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| creator | BASTEIN, ANTONIUS GERARDUS THEODORUS MARIA MAAS, DIEDERIK JAN KLINKHAMER, JACOB FREDERIK FRISO OOSTROM, SJOERD DE JAGER, PIETER WILLEM HERMAN |
| description | The invention relates to a method of patterning a hard disk medium, comprising the step of applying a lithographic process to a resistive top layer of the hard disk medium, wherein the resistive top layer is exposed to a beam having multiple electron or optical beamlets. Preferably, foci of the multiple beamlets are arranged at different radial distances from a center point of the hard disk, more preferably substantially on a line extending from the center point of the hard disk to an edge of the hard disk.
L'invention concerne un procédé servant à configurer un disque dur et consistant à appliquer un traitement lithographique à une couche supérieure résistante du disque dur, ladite couche étant exposée à un faisceau composé de multiples petits faisceaux secondaires optiques ou électroniques. Les points focaux de ces faisceaux secondaires multiples sont, de préférence, situés à des distances radiales différentes d'un point central du disque dur et, dans un mode de réalisation préféré, sur une ligne s'étendant du point central du disque dur à un bord de celui-ci. |
| format | Patent |
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L'invention concerne un procédé servant à configurer un disque dur et consistant à appliquer un traitement lithographique à une couche supérieure résistante du disque dur, ladite couche étant exposée à un faisceau composé de multiples petits faisceaux secondaires optiques ou électroniques. Les points focaux de ces faisceaux secondaires multiples sont, de préférence, situés à des distances radiales différentes d'un point central du disque dur et, dans un mode de réalisation préféré, sur une ligne s'étendant du point central du disque dur à un bord de celui-ci.</description><language>eng ; fre</language><subject>INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; NANOTECHNOLOGY ; PERFORMING OPERATIONS ; PHYSICS ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TRANSPORTING</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090522&DB=EPODOC&CC=WO&NR=2009041816A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090522&DB=EPODOC&CC=WO&NR=2009041816A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BASTEIN, ANTONIUS GERARDUS THEODORUS MARIA</creatorcontrib><creatorcontrib>MAAS, DIEDERIK JAN</creatorcontrib><creatorcontrib>KLINKHAMER, JACOB FREDERIK FRISO</creatorcontrib><creatorcontrib>OOSTROM, SJOERD</creatorcontrib><creatorcontrib>DE JAGER, PIETER WILLEM HERMAN</creatorcontrib><title>A METHOD OF PATTERNING A HARD DISK MEDIUM</title><description>The invention relates to a method of patterning a hard disk medium, comprising the step of applying a lithographic process to a resistive top layer of the hard disk medium, wherein the resistive top layer is exposed to a beam having multiple electron or optical beamlets. Preferably, foci of the multiple beamlets are arranged at different radial distances from a center point of the hard disk, more preferably substantially on a line extending from the center point of the hard disk to an edge of the hard disk.
L'invention concerne un procédé servant à configurer un disque dur et consistant à appliquer un traitement lithographique à une couche supérieure résistante du disque dur, ladite couche étant exposée à un faisceau composé de multiples petits faisceaux secondaires optiques ou électroniques. Les points focaux de ces faisceaux secondaires multiples sont, de préférence, situés à des distances radiales différentes d'un point central du disque dur et, dans un mode de réalisation préféré, sur une ligne s'étendant du point central du disque dur à un bord de celui-ci.</description><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>NANOTECHNOLOGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB0VPB1DfHwd1Hwd1MIcAwJcQ3y8_RzV3BU8HAMclFw8Qz2Bipw8Qz15WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgYGlgYmhhaGZo7GxsSpAgB-7iTB</recordid><startdate>20090522</startdate><enddate>20090522</enddate><creator>BASTEIN, ANTONIUS GERARDUS THEODORUS MARIA</creator><creator>MAAS, DIEDERIK JAN</creator><creator>KLINKHAMER, JACOB FREDERIK FRISO</creator><creator>OOSTROM, SJOERD</creator><creator>DE JAGER, PIETER WILLEM HERMAN</creator><scope>EVB</scope></search><sort><creationdate>20090522</creationdate><title>A METHOD OF PATTERNING A HARD DISK MEDIUM</title><author>BASTEIN, ANTONIUS GERARDUS THEODORUS MARIA ; MAAS, DIEDERIK JAN ; KLINKHAMER, JACOB FREDERIK FRISO ; OOSTROM, SJOERD ; DE JAGER, PIETER WILLEM HERMAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2009041816A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2009</creationdate><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>NANOTECHNOLOGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BASTEIN, ANTONIUS GERARDUS THEODORUS MARIA</creatorcontrib><creatorcontrib>MAAS, DIEDERIK JAN</creatorcontrib><creatorcontrib>KLINKHAMER, JACOB FREDERIK FRISO</creatorcontrib><creatorcontrib>OOSTROM, SJOERD</creatorcontrib><creatorcontrib>DE JAGER, PIETER WILLEM HERMAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BASTEIN, ANTONIUS GERARDUS THEODORUS MARIA</au><au>MAAS, DIEDERIK JAN</au><au>KLINKHAMER, JACOB FREDERIK FRISO</au><au>OOSTROM, SJOERD</au><au>DE JAGER, PIETER WILLEM HERMAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A METHOD OF PATTERNING A HARD DISK MEDIUM</title><date>2009-05-22</date><risdate>2009</risdate><abstract>The invention relates to a method of patterning a hard disk medium, comprising the step of applying a lithographic process to a resistive top layer of the hard disk medium, wherein the resistive top layer is exposed to a beam having multiple electron or optical beamlets. Preferably, foci of the multiple beamlets are arranged at different radial distances from a center point of the hard disk, more preferably substantially on a line extending from the center point of the hard disk to an edge of the hard disk.
L'invention concerne un procédé servant à configurer un disque dur et consistant à appliquer un traitement lithographique à une couche supérieure résistante du disque dur, ladite couche étant exposée à un faisceau composé de multiples petits faisceaux secondaires optiques ou électroniques. Les points focaux de ces faisceaux secondaires multiples sont, de préférence, situés à des distances radiales différentes d'un point central du disque dur et, dans un mode de réalisation préféré, sur une ligne s'étendant du point central du disque dur à un bord de celui-ci.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY PERFORMING OPERATIONS PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
| title | A METHOD OF PATTERNING A HARD DISK MEDIUM |
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