GLASS-CERAMIC AND GLASS-CERAMIC/CERAMIC COMPOSITE SEMICONDUCTOR MANUFACTURING ARTICLE SUPPORT DEVICES

Disclosed is an article support or handling material configured to support an article to be placed in a beam path of a radiation beam of a lithographic apparatus. The article support or handling material comprises a glass-ceramic material which exhibits a fracture toughness of greater than 1.5 MPa/m...

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Bibliographische Detailangaben
Hauptverfasser:	SERWAZI, MARCUS, R, BEALL, DOUGLAS, M, WONDRACZEK, LOTHAR, LINDER, MICHAEL, W
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GLASS HOLOGRAPHY JOINING GLASS TO GLASS OR OTHER MATERIALS LIME, MAGNESIA MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REFRACTORIES SEMICONDUCTOR DEVICES SLAG SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TREATMENT OF NATURAL STONE
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