DICHROIC FILTERS FORMED USING SILICON CARBIDE BASED LAYERS
The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a firs...
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| creator | ZAMBOV, LUDMIL, M SHAMAMIAN, VASGEN, A PERZ, SUSAN, V SEIFFERLY, JEFFREY, A |
| description | The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a first index of refraction and a second layer formed of a silicon-and-carbon containing material having a second index of refraction that is different than the first index of refraction.
La présente invention concerne un procédé de formation d'un filtre optique dichroïque flexible. Le procédé comprend le dépôt d'une pluralité de paires de couches adjacentes à un substrat. Chacune de la pluralité de paires de couches comprend une première couche formée d'un matériau contenant du silicium et du carbone ayant un premier indice de réfraction et d'une seconde couche formée d'un matériau contenant du silicium et du carbone ayant un second indice de réfraction qui est différent du premier indice de réfraction. |
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La présente invention concerne un procédé de formation d'un filtre optique dichroïque flexible. Le procédé comprend le dépôt d'une pluralité de paires de couches adjacentes à un substrat. Chacune de la pluralité de paires de couches comprend une première couche formée d'un matériau contenant du silicium et du carbone ayant un premier indice de réfraction et d'une seconde couche formée d'un matériau contenant du silicium et du carbone ayant un second indice de réfraction qui est différent du premier indice de réfraction.</description><language>eng ; fre</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090219&DB=EPODOC&CC=WO&NR=2009023482A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090219&DB=EPODOC&CC=WO&NR=2009023482A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZAMBOV, LUDMIL, M</creatorcontrib><creatorcontrib>SHAMAMIAN, VASGEN, A</creatorcontrib><creatorcontrib>PERZ, SUSAN, V</creatorcontrib><creatorcontrib>SEIFFERLY, JEFFREY, A</creatorcontrib><title>DICHROIC FILTERS FORMED USING SILICON CARBIDE BASED LAYERS</title><description>The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a first index of refraction and a second layer formed of a silicon-and-carbon containing material having a second index of refraction that is different than the first index of refraction.
La présente invention concerne un procédé de formation d'un filtre optique dichroïque flexible. Le procédé comprend le dépôt d'une pluralité de paires de couches adjacentes à un substrat. Chacune de la pluralité de paires de couches comprend une première couche formée d'un matériau contenant du silicium et du carbone ayant un premier indice de réfraction et d'une seconde couche formée d'un matériau contenant du silicium et du carbone ayant un second indice de réfraction qui est différent du premier indice de réfraction.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBy8XT2CPL3dFZw8_QJcQ0KVnDzD_J1dVEIDfb0c1cI9vTxdPb3U3B2DHLydHFVcHIMBsr5OEYCVfIwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvhwfyMDA0sDI2MTCyNHQ2PiVAEAQawpuA</recordid><startdate>20090219</startdate><enddate>20090219</enddate><creator>ZAMBOV, LUDMIL, M</creator><creator>SHAMAMIAN, VASGEN, A</creator><creator>PERZ, SUSAN, V</creator><creator>SEIFFERLY, JEFFREY, A</creator><scope>EVB</scope></search><sort><creationdate>20090219</creationdate><title>DICHROIC FILTERS FORMED USING SILICON CARBIDE BASED LAYERS</title><author>ZAMBOV, LUDMIL, M ; SHAMAMIAN, VASGEN, A ; PERZ, SUSAN, V ; SEIFFERLY, JEFFREY, A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2009023482A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2009</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ZAMBOV, LUDMIL, M</creatorcontrib><creatorcontrib>SHAMAMIAN, VASGEN, A</creatorcontrib><creatorcontrib>PERZ, SUSAN, V</creatorcontrib><creatorcontrib>SEIFFERLY, JEFFREY, A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZAMBOV, LUDMIL, M</au><au>SHAMAMIAN, VASGEN, A</au><au>PERZ, SUSAN, V</au><au>SEIFFERLY, JEFFREY, A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DICHROIC FILTERS FORMED USING SILICON CARBIDE BASED LAYERS</title><date>2009-02-19</date><risdate>2009</risdate><abstract>The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a first index of refraction and a second layer formed of a silicon-and-carbon containing material having a second index of refraction that is different than the first index of refraction.
La présente invention concerne un procédé de formation d'un filtre optique dichroïque flexible. Le procédé comprend le dépôt d'une pluralité de paires de couches adjacentes à un substrat. Chacune de la pluralité de paires de couches comprend une première couche formée d'un matériau contenant du silicium et du carbone ayant un premier indice de réfraction et d'une seconde couche formée d'un matériau contenant du silicium et du carbone ayant un second indice de réfraction qui est différent du premier indice de réfraction.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS |
| title | DICHROIC FILTERS FORMED USING SILICON CARBIDE BASED LAYERS |
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