LOW VAPOR PRESSURE HIGH PURITY GAS DELIVERY SYSTEM

Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the low vapor pressure fluid pressure...

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Hauptverfasser: JOHNSON, MICHAEL, CLINTON, SARIGIANNIDIS, CHRISTOS, CHAKRAVARTI, SHRIKAR, BERGMAN, THOMAS, JOHN
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creator JOHNSON, MICHAEL, CLINTON
SARIGIANNIDIS, CHRISTOS
CHAKRAVARTI, SHRIKAR
BERGMAN, THOMAS, JOHN
description Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the low vapor pressure fluid pressure falls below a specified value for the purpose of removing a first supply vessel from service by discontinuing vapor flow from the first supply vessel and initiating vapor flow from a second supply vessel. La présente invention concerne des systèmes, des appareils et des procédés de distribution de fluide en phase vapeur en vue d'une utilisation terminale désirée, dans lesquels les conditions du système sont surveillées pour déterminer le moment où la teneur en eau ou la température de surface de la cuve d'alimentation dépasse une valeur spécifiée ou bien le moment où la pression du fluide à faible tension de vapeur chute en deçà d'une valeur spécifiée afin de mettre hors service une cuve d'alimentation par arrêt du flux de vapeur provenant de la première cuve d'alimentation et mise en route du flux de vapeur à partir d'une deuxième cuve d'alimentation.
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La présente invention concerne des systèmes, des appareils et des procédés de distribution de fluide en phase vapeur en vue d'une utilisation terminale désirée, dans lesquels les conditions du système sont surveillées pour déterminer le moment où la teneur en eau ou la température de surface de la cuve d'alimentation dépasse une valeur spécifiée ou bien le moment où la pression du fluide à faible tension de vapeur chute en deçà d'une valeur spécifiée afin de mettre hors service une cuve d'alimentation par arrêt du flux de vapeur provenant de la première cuve d'alimentation et mise en route du flux de vapeur à partir d'une deuxième cuve d'alimentation.</description><language>eng ; fre</language><subject>BLASTING ; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES ; FIXED-CAPACITY GAS-HOLDERS ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; STORING OF DISTRIBUTING GASES OR LIQUIDS ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES ; WEAPONS</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080703&amp;DB=EPODOC&amp;CC=WO&amp;NR=2008042710A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080703&amp;DB=EPODOC&amp;CC=WO&amp;NR=2008042710A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JOHNSON, MICHAEL, CLINTON</creatorcontrib><creatorcontrib>SARIGIANNIDIS, CHRISTOS</creatorcontrib><creatorcontrib>CHAKRAVARTI, SHRIKAR</creatorcontrib><creatorcontrib>BERGMAN, THOMAS, JOHN</creatorcontrib><title>LOW VAPOR PRESSURE HIGH PURITY GAS DELIVERY SYSTEM</title><description>Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the low vapor pressure fluid pressure falls below a specified value for the purpose of removing a first supply vessel from service by discontinuing vapor flow from the first supply vessel and initiating vapor flow from a second supply vessel. 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language eng ; fre
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subjects BLASTING
FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES
FIXED-CAPACITY GAS-HOLDERS
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
HEATING
LIGHTING
MECHANICAL ENGINEERING
STORING OF DISTRIBUTING GASES OR LIQUIDS
TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES
WEAPONS
title LOW VAPOR PRESSURE HIGH PURITY GAS DELIVERY SYSTEM
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