PROCESS AND COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING
Compositions and methods for processing a substrate having a conductive material layer disposed thereon are provided. In one embodiment, a composition for processing a substrate having a conductive material layer disposed thereon is provided which composition includes an acid based electrolyte, a ch...
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| creator | HSU, WEI-YUNG JIA, RENHE MAO, DAXIN CHEN, LIANG-YUH EWALD, ROBERT A TIAN, YUAN A LIU, FENG Q DUBOUST, ALAIN KARUPPIAH, LAKSH DIAO, JIE WANG, YOU DU, TIANBAO TSAI, STAN D WANG, ZHIHONG ZHAO, JUNZI |
| description | Compositions and methods for processing a substrate having a conductive material layer disposed thereon are provided. In one embodiment, a composition for processing a substrate having a conductive material layer disposed thereon is provided which composition includes an acid based electrolyte, a chelating agent, a corrosion inhibitor, a passivating polymeric material, a pH adjusting agent, a solvent, and a pH between about 3 and about 10. The composition is used in a method to form a passivation layer on the conductive material layer, abrading the passivation layer to expose a portion of the conductive material layer, applying a bias to the substrate, and removing the conductive material layer.
La présente invention concerne des compositions et des procédés pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Un mode de réalisation concerne une composition pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Cette composition comprend un électrolyte à base acide, un agent chélateur, un inhibiteur de corrosion, un matériau polymère de passivation, un agent de régulation de pH, ainsi qu'un solvant et présente un pH situé entre environ 3 et environ 10. Ladite composition est utilisée dans le cadre d'un procédé pour former une couche de passivation sur la couche de matière conductrice qui consiste à abraser la couche de passivation afin d'exposer la couche de matière conductrice, à appliquer une polarisation au niveau du substrat, puis à retirer la couche de matière conductrice. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2007047454A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2007047454A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2007047454A33</originalsourceid><addsrcrecordid>eNrjZHAICPJ3dg0OVnD0c1Fw9vcN8A_2DPH091Nw8w9ScPVxdQ4Bynu4-no6O_oo-Lo6ezj6gZkB_j6ewR6efu48DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-3N_IwMDcwMTcxNTE0diYOFUAamcrwA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PROCESS AND COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING</title><source>esp@cenet</source><creator>HSU, WEI-YUNG ; JIA, RENHE ; MAO, DAXIN ; CHEN, LIANG-YUH ; EWALD, ROBERT A ; TIAN, YUAN A ; LIU, FENG Q ; DUBOUST, ALAIN ; KARUPPIAH, LAKSH ; DIAO, JIE ; WANG, YOU ; DU, TIANBAO ; TSAI, STAN D ; WANG, ZHIHONG ; ZHAO, JUNZI</creator><creatorcontrib>HSU, WEI-YUNG ; JIA, RENHE ; MAO, DAXIN ; CHEN, LIANG-YUH ; EWALD, ROBERT A ; TIAN, YUAN A ; LIU, FENG Q ; DUBOUST, ALAIN ; KARUPPIAH, LAKSH ; DIAO, JIE ; WANG, YOU ; DU, TIANBAO ; TSAI, STAN D ; WANG, ZHIHONG ; ZHAO, JUNZI</creatorcontrib><description>Compositions and methods for processing a substrate having a conductive material layer disposed thereon are provided. In one embodiment, a composition for processing a substrate having a conductive material layer disposed thereon is provided which composition includes an acid based electrolyte, a chelating agent, a corrosion inhibitor, a passivating polymeric material, a pH adjusting agent, a solvent, and a pH between about 3 and about 10. The composition is used in a method to form a passivation layer on the conductive material layer, abrading the passivation layer to expose a portion of the conductive material layer, applying a bias to the substrate, and removing the conductive material layer.
La présente invention concerne des compositions et des procédés pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Un mode de réalisation concerne une composition pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Cette composition comprend un électrolyte à base acide, un agent chélateur, un inhibiteur de corrosion, un matériau polymère de passivation, un agent de régulation de pH, ainsi qu'un solvant et présente un pH situé entre environ 3 et environ 10. Ladite composition est utilisée dans le cadre d'un procédé pour former une couche de passivation sur la couche de matière conductrice qui consiste à abraser la couche de passivation afin d'exposer la couche de matière conductrice, à appliquer une polarisation au niveau du substrat, puis à retirer la couche de matière conductrice.</description><language>eng ; fre</language><subject>ADHESIVES ; APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; MACHINE TOOLS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS ; SEMICONDUCTOR DEVICES ; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL ; TRANSPORTING ; WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080117&DB=EPODOC&CC=WO&NR=2007047454A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080117&DB=EPODOC&CC=WO&NR=2007047454A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HSU, WEI-YUNG</creatorcontrib><creatorcontrib>JIA, RENHE</creatorcontrib><creatorcontrib>MAO, DAXIN</creatorcontrib><creatorcontrib>CHEN, LIANG-YUH</creatorcontrib><creatorcontrib>EWALD, ROBERT A</creatorcontrib><creatorcontrib>TIAN, YUAN A</creatorcontrib><creatorcontrib>LIU, FENG Q</creatorcontrib><creatorcontrib>DUBOUST, ALAIN</creatorcontrib><creatorcontrib>KARUPPIAH, LAKSH</creatorcontrib><creatorcontrib>DIAO, JIE</creatorcontrib><creatorcontrib>WANG, YOU</creatorcontrib><creatorcontrib>DU, TIANBAO</creatorcontrib><creatorcontrib>TSAI, STAN D</creatorcontrib><creatorcontrib>WANG, ZHIHONG</creatorcontrib><creatorcontrib>ZHAO, JUNZI</creatorcontrib><title>PROCESS AND COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING</title><description>Compositions and methods for processing a substrate having a conductive material layer disposed thereon are provided. In one embodiment, a composition for processing a substrate having a conductive material layer disposed thereon is provided which composition includes an acid based electrolyte, a chelating agent, a corrosion inhibitor, a passivating polymeric material, a pH adjusting agent, a solvent, and a pH between about 3 and about 10. The composition is used in a method to form a passivation layer on the conductive material layer, abrading the passivation layer to expose a portion of the conductive material layer, applying a bias to the substrate, and removing the conductive material layer.
La présente invention concerne des compositions et des procédés pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Un mode de réalisation concerne une composition pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Cette composition comprend un électrolyte à base acide, un agent chélateur, un inhibiteur de corrosion, un matériau polymère de passivation, un agent de régulation de pH, ainsi qu'un solvant et présente un pH situé entre environ 3 et environ 10. Ladite composition est utilisée dans le cadre d'un procédé pour former une couche de passivation sur la couche de matière conductrice qui consiste à abraser la couche de passivation afin d'exposer la couche de matière conductrice, à appliquer une polarisation au niveau du substrat, puis à retirer la couche de matière conductrice.</description><subject>ADHESIVES</subject><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>MACHINE TOOLS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METAL-WORKING NOT OTHERWISE PROVIDED FOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL</subject><subject>TRANSPORTING</subject><subject>WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAICPJ3dg0OVnD0c1Fw9vcN8A_2DPH091Nw8w9ScPVxdQ4Bynu4-no6O_oo-Lo6ezj6gZkB_j6ewR6efu48DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-3N_IwMDcwMTcxNTE0diYOFUAamcrwA</recordid><startdate>20080117</startdate><enddate>20080117</enddate><creator>HSU, WEI-YUNG</creator><creator>JIA, RENHE</creator><creator>MAO, DAXIN</creator><creator>CHEN, LIANG-YUH</creator><creator>EWALD, ROBERT A</creator><creator>TIAN, YUAN A</creator><creator>LIU, FENG Q</creator><creator>DUBOUST, ALAIN</creator><creator>KARUPPIAH, LAKSH</creator><creator>DIAO, JIE</creator><creator>WANG, YOU</creator><creator>DU, TIANBAO</creator><creator>TSAI, STAN D</creator><creator>WANG, ZHIHONG</creator><creator>ZHAO, JUNZI</creator><scope>EVB</scope></search><sort><creationdate>20080117</creationdate><title>PROCESS AND COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING</title><author>HSU, WEI-YUNG ; JIA, RENHE ; MAO, DAXIN ; CHEN, LIANG-YUH ; EWALD, ROBERT A ; TIAN, YUAN A ; LIU, FENG Q ; DUBOUST, ALAIN ; KARUPPIAH, LAKSH ; DIAO, JIE ; WANG, YOU ; DU, TIANBAO ; TSAI, STAN D ; WANG, ZHIHONG ; ZHAO, JUNZI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2007047454A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2008</creationdate><topic>ADHESIVES</topic><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>MACHINE TOOLS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METAL-WORKING NOT OTHERWISE PROVIDED FOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL</topic><topic>TRANSPORTING</topic><topic>WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL</topic><toplevel>online_resources</toplevel><creatorcontrib>HSU, WEI-YUNG</creatorcontrib><creatorcontrib>JIA, RENHE</creatorcontrib><creatorcontrib>MAO, DAXIN</creatorcontrib><creatorcontrib>CHEN, LIANG-YUH</creatorcontrib><creatorcontrib>EWALD, ROBERT A</creatorcontrib><creatorcontrib>TIAN, YUAN A</creatorcontrib><creatorcontrib>LIU, FENG Q</creatorcontrib><creatorcontrib>DUBOUST, ALAIN</creatorcontrib><creatorcontrib>KARUPPIAH, LAKSH</creatorcontrib><creatorcontrib>DIAO, JIE</creatorcontrib><creatorcontrib>WANG, YOU</creatorcontrib><creatorcontrib>DU, TIANBAO</creatorcontrib><creatorcontrib>TSAI, STAN D</creatorcontrib><creatorcontrib>WANG, ZHIHONG</creatorcontrib><creatorcontrib>ZHAO, JUNZI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HSU, WEI-YUNG</au><au>JIA, RENHE</au><au>MAO, DAXIN</au><au>CHEN, LIANG-YUH</au><au>EWALD, ROBERT A</au><au>TIAN, YUAN A</au><au>LIU, FENG Q</au><au>DUBOUST, ALAIN</au><au>KARUPPIAH, LAKSH</au><au>DIAO, JIE</au><au>WANG, YOU</au><au>DU, TIANBAO</au><au>TSAI, STAN D</au><au>WANG, ZHIHONG</au><au>ZHAO, JUNZI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESS AND COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING</title><date>2008-01-17</date><risdate>2008</risdate><abstract>Compositions and methods for processing a substrate having a conductive material layer disposed thereon are provided. In one embodiment, a composition for processing a substrate having a conductive material layer disposed thereon is provided which composition includes an acid based electrolyte, a chelating agent, a corrosion inhibitor, a passivating polymeric material, a pH adjusting agent, a solvent, and a pH between about 3 and about 10. The composition is used in a method to form a passivation layer on the conductive material layer, abrading the passivation layer to expose a portion of the conductive material layer, applying a bias to the substrate, and removing the conductive material layer.
La présente invention concerne des compositions et des procédés pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Un mode de réalisation concerne une composition pour traiter un substrat sur lequel se trouve une couche de matière conductrice. Cette composition comprend un électrolyte à base acide, un agent chélateur, un inhibiteur de corrosion, un matériau polymère de passivation, un agent de régulation de pH, ainsi qu'un solvant et présente un pH situé entre environ 3 et environ 10. Ladite composition est utilisée dans le cadre d'un procédé pour former une couche de passivation sur la couche de matière conductrice qui consiste à abraser la couche de passivation afin d'exposer la couche de matière conductrice, à appliquer une polarisation au niveau du substrat, puis à retirer la couche de matière conductrice.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES MACHINE TOOLS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS SEMICONDUCTOR DEVICES SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL TRANSPORTING WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL |
| title | PROCESS AND COMPOSITION FOR ELECTROCHEMICAL MECHANICAL POLISHING |
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