METHOD FOR IMPROVING REFRACTIVE INDEX CONTROL IN PECVD DEPOSITED A-SINY FILMS

An apparatus, device, system, and method for controlling the index of refraction of at least one layer of amorphous silicon-based film deposited on a substrate are disclosed. The apparatus, device, system and method include providing at least one volume of each of N2, SiH4, and He, and depositing th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CAPEWELL, DAVID, R, YANG, LIYOU, WHALEY, RALPH, ABELES, JOSEPH, KHARAS, BORIS, DIMARCO, LOUIS, MOHSENI, HOORMAN, MALEY, NAGENDRANATH, KWAKERNAAK, MARTIN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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