SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE
A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In ano...
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description | A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.
L'invention concerne un système permettant de protéger un composant interne de source lumineuse EUV contre les ions générés au niveau d'un site de formation de plasma. Selon un aspect, le système peut comprendre une pluralité de plaques minces et un agencement permettant de générer un champ magnétique afin de dévier des ions sur l'une des surfaces de plaque mince. Selon un autre aspect, une grille électrostatique peut être positionnée afin d'interagir avec des ions et de limiter l'énergie ionique, un champ magnétique pouvant être utilisé pour dévier les ions d'énergie limitée sur des chemins dans lesquels les ions ne frappent pas le composant interne. Selon un dernier aspect, une grille peut être connectée à un circuit accordé à une fréquence résonante afin de limiter l'énergie ionique. La fréquence résonante peut, par exemple, être sensiblement égale à l'inverse d'une différence temporelle entre le moment où des électrons atteignent la grille et un moment ultérieur où des ions atteignent la grille. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2006135546A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2006135546A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2006135546A23</originalsourceid><addsrcrecordid>eNqNi0EKwjAQRbtxIeodBlwXaqvdh2TSFJqZkkwrrkQkrkQFvYPXlqIHcPXhvffn2TseoqCPoMiAR3FsIlgOYNB2qKWlBvpORa_yBgmDEjTQMkUQhj7giCQgDr_MBvYQUGk3_RRBS4KBVAeafc80xWwngcMIXds4gchD0LjMZpfT9ZlWv11ka4uiXZ4e92N6Pk7ndEuv457Loqg31W63rVVZ_Vd9APF7PsA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE</title><source>esp@cenet</source><creator>HOFFMAN, JERZY, R ; VARGAS, ERNESTO, L ; RETTIG, CURTIS, L</creator><creatorcontrib>HOFFMAN, JERZY, R ; VARGAS, ERNESTO, L ; RETTIG, CURTIS, L</creatorcontrib><description>A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.
L'invention concerne un système permettant de protéger un composant interne de source lumineuse EUV contre les ions générés au niveau d'un site de formation de plasma. Selon un aspect, le système peut comprendre une pluralité de plaques minces et un agencement permettant de générer un champ magnétique afin de dévier des ions sur l'une des surfaces de plaque mince. Selon un autre aspect, une grille électrostatique peut être positionnée afin d'interagir avec des ions et de limiter l'énergie ionique, un champ magnétique pouvant être utilisé pour dévier les ions d'énergie limitée sur des chemins dans lesquels les ions ne frappent pas le composant interne. Selon un dernier aspect, une grille peut être connectée à un circuit accordé à une fréquence résonante afin de limiter l'énergie ionique. La fréquence résonante peut, par exemple, être sensiblement égale à l'inverse d'une différence temporelle entre le moment où des électrons atteignent la grille et un moment ultérieur où des ions atteignent la grille.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HAND TOOLS ; HAND-HELD NAILING OR STAPLING TOOLS ; HOLOGRAPHY ; MANIPULATORS ; MANUALLY OPERATED PORTABLE STAPLING TOOLS ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MATERIALS THEREFOR ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; NANOTECHNOLOGY ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; NUCLEAR REACTORS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PORTABLE POWER-DRIVEN TOOLS ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TRANSPORTING ; X-RAY TECHNIQUE</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061221&DB=EPODOC&CC=WO&NR=2006135546A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061221&DB=EPODOC&CC=WO&NR=2006135546A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HOFFMAN, JERZY, R</creatorcontrib><creatorcontrib>VARGAS, ERNESTO, L</creatorcontrib><creatorcontrib>RETTIG, CURTIS, L</creatorcontrib><title>SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE</title><description>A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.
L'invention concerne un système permettant de protéger un composant interne de source lumineuse EUV contre les ions générés au niveau d'un site de formation de plasma. Selon un aspect, le système peut comprendre une pluralité de plaques minces et un agencement permettant de générer un champ magnétique afin de dévier des ions sur l'une des surfaces de plaque mince. Selon un autre aspect, une grille électrostatique peut être positionnée afin d'interagir avec des ions et de limiter l'énergie ionique, un champ magnétique pouvant être utilisé pour dévier les ions d'énergie limitée sur des chemins dans lesquels les ions ne frappent pas le composant interne. Selon un dernier aspect, une grille peut être connectée à un circuit accordé à une fréquence résonante afin de limiter l'énergie ionique. La fréquence résonante peut, par exemple, être sensiblement égale à l'inverse d'une différence temporelle entre le moment où des électrons atteignent la grille et un moment ultérieur où des ions atteignent la grille.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HAND TOOLS</subject><subject>HAND-HELD NAILING OR STAPLING TOOLS</subject><subject>HOLOGRAPHY</subject><subject>MANIPULATORS</subject><subject>MANUALLY OPERATED PORTABLE STAPLING TOOLS</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>NANOTECHNOLOGY</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>NUCLEAR REACTORS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PORTABLE POWER-DRIVEN TOOLS</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TRANSPORTING</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi0EKwjAQRbtxIeodBlwXaqvdh2TSFJqZkkwrrkQkrkQFvYPXlqIHcPXhvffn2TseoqCPoMiAR3FsIlgOYNB2qKWlBvpORa_yBgmDEjTQMkUQhj7giCQgDr_MBvYQUGk3_RRBS4KBVAeafc80xWwngcMIXds4gchD0LjMZpfT9ZlWv11ka4uiXZ4e92N6Pk7ndEuv457Loqg31W63rVVZ_Vd9APF7PsA</recordid><startdate>20061221</startdate><enddate>20061221</enddate><creator>HOFFMAN, JERZY, R</creator><creator>VARGAS, ERNESTO, L</creator><creator>RETTIG, CURTIS, L</creator><scope>EVB</scope></search><sort><creationdate>20061221</creationdate><title>SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE</title><author>HOFFMAN, JERZY, R ; VARGAS, ERNESTO, L ; RETTIG, CURTIS, L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2006135546A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2006</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HAND TOOLS</topic><topic>HAND-HELD NAILING OR STAPLING TOOLS</topic><topic>HOLOGRAPHY</topic><topic>MANIPULATORS</topic><topic>MANUALLY OPERATED PORTABLE STAPLING TOOLS</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>NANOTECHNOLOGY</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>NUCLEAR REACTORS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PORTABLE POWER-DRIVEN TOOLS</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TRANSPORTING</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>HOFFMAN, JERZY, R</creatorcontrib><creatorcontrib>VARGAS, ERNESTO, L</creatorcontrib><creatorcontrib>RETTIG, CURTIS, L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HOFFMAN, JERZY, R</au><au>VARGAS, ERNESTO, L</au><au>RETTIG, CURTIS, L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE</title><date>2006-12-21</date><risdate>2006</risdate><abstract>A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.
L'invention concerne un système permettant de protéger un composant interne de source lumineuse EUV contre les ions générés au niveau d'un site de formation de plasma. Selon un aspect, le système peut comprendre une pluralité de plaques minces et un agencement permettant de générer un champ magnétique afin de dévier des ions sur l'une des surfaces de plaque mince. Selon un autre aspect, une grille électrostatique peut être positionnée afin d'interagir avec des ions et de limiter l'énergie ionique, un champ magnétique pouvant être utilisé pour dévier les ions d'énergie limitée sur des chemins dans lesquels les ions ne frappent pas le composant interne. Selon un dernier aspect, une grille peut être connectée à un circuit accordé à une fréquence résonante afin de limiter l'énergie ionique. La fréquence résonante peut, par exemple, être sensiblement égale à l'inverse d'une différence temporelle entre le moment où des électrons atteignent la grille et un moment ultérieur où des ions atteignent la grille.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HAND TOOLS HAND-HELD NAILING OR STAPLING TOOLS HOLOGRAPHY MANIPULATORS MANUALLY OPERATED PORTABLE STAPLING TOOLS MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY NUCLEAR ENGINEERING NUCLEAR PHYSICS NUCLEAR REACTORS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PORTABLE POWER-DRIVEN TOOLS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING X-RAY TECHNIQUE |
title | SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T05%3A17%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HOFFMAN,%20JERZY,%20R&rft.date=2006-12-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2006135546A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |