SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE

A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In ano...

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Hauptverfasser: HOFFMAN, JERZY, R, VARGAS, ERNESTO, L, RETTIG, CURTIS, L
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VARGAS, ERNESTO, L
RETTIG, CURTIS, L
description A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid. L'invention concerne un système permettant de protéger un composant interne de source lumineuse EUV contre les ions générés au niveau d'un site de formation de plasma. Selon un aspect, le système peut comprendre une pluralité de plaques minces et un agencement permettant de générer un champ magnétique afin de dévier des ions sur l'une des surfaces de plaque mince. Selon un autre aspect, une grille électrostatique peut être positionnée afin d'interagir avec des ions et de limiter l'énergie ionique, un champ magnétique pouvant être utilisé pour dévier les ions d'énergie limitée sur des chemins dans lesquels les ions ne frappent pas le composant interne. Selon un dernier aspect, une grille peut être connectée à un circuit accordé à une fréquence résonante afin de limiter l'énergie ionique. La fréquence résonante peut, par exemple, être sensiblement égale à l'inverse d'une différence temporelle entre le moment où des électrons atteignent la grille et un moment ultérieur où des ions atteignent la grille.
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In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid. L'invention concerne un système permettant de protéger un composant interne de source lumineuse EUV contre les ions générés au niveau d'un site de formation de plasma. Selon un aspect, le système peut comprendre une pluralité de plaques minces et un agencement permettant de générer un champ magnétique afin de dévier des ions sur l'une des surfaces de plaque mince. Selon un autre aspect, une grille électrostatique peut être positionnée afin d'interagir avec des ions et de limiter l'énergie ionique, un champ magnétique pouvant être utilisé pour dévier les ions d'énergie limitée sur des chemins dans lesquels les ions ne frappent pas le composant interne. Selon un dernier aspect, une grille peut être connectée à un circuit accordé à une fréquence résonante afin de limiter l'énergie ionique. La fréquence résonante peut, par exemple, être sensiblement égale à l'inverse d'une différence temporelle entre le moment où des électrons atteignent la grille et un moment ultérieur où des ions atteignent la grille.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HAND TOOLS
HAND-HELD NAILING OR STAPLING TOOLS
HOLOGRAPHY
MANIPULATORS
MANUALLY OPERATED PORTABLE STAPLING TOOLS
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MATERIALS THEREFOR
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
NUCLEAR REACTORS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PORTABLE POWER-DRIVEN TOOLS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
X-RAY TECHNIQUE
title SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE
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