POLISHING SLURRY
The present invention discloses a polishing slurry, wherein, the said polishing slurry contains a carrier and functional-alumina grains. The present polishing slurry which contains functional - alumina grains has good stability, this polishing slurry can reduce the rate of defect , improve the quali...
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creator | SHIAO, DANNY, ZHENGLONG YANG, ANDY, CHUNXIAO |
description | The present invention discloses a polishing slurry, wherein, the said polishing slurry contains a carrier and functional-alumina grains. The present polishing slurry which contains functional - alumina grains has good stability, this polishing slurry can reduce the rate of defect , improve the quality of the substrate surface, lessen the total metal loss rate and widen the variation range of the technological parameters.
La présente invention concerne une pâte à polissage, ladite pâte à polissage contenant un véhicule et des grains à fonctions alumines. La présente pâte à polissage, qui contient des grains à fonctions alumines, présente une bonne stabilité, et cette pâte à polissage peut minimiser le taux de défauts, améliorer la qualité de la surface du substrat, réduire le taux total de perte de métaux, et élargir la gamme de variation des paramètres technologiques. |
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La présente invention concerne une pâte à polissage, ladite pâte à polissage contenant un véhicule et des grains à fonctions alumines. La présente pâte à polissage, qui contient des grains à fonctions alumines, présente une bonne stabilité, et cette pâte à polissage peut minimiser le taux de défauts, améliorer la qualité de la surface du substrat, réduire le taux total de perte de métaux, et élargir la gamme de variation des paramètres technologiques.</description><language>chi ; eng ; fre</language><subject>ADHESIVES ; CHEMISTRY ; DYES ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061123&DB=EPODOC&CC=WO&NR=2006122492A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061123&DB=EPODOC&CC=WO&NR=2006122492A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIAO, DANNY, ZHENGLONG</creatorcontrib><creatorcontrib>YANG, ANDY, CHUNXIAO</creatorcontrib><title>POLISHING SLURRY</title><description>The present invention discloses a polishing slurry, wherein, the said polishing slurry contains a carrier and functional-alumina grains. The present polishing slurry which contains functional - alumina grains has good stability, this polishing slurry can reduce the rate of defect , improve the quality of the substrate surface, lessen the total metal loss rate and widen the variation range of the technological parameters.
La présente invention concerne une pâte à polissage, ladite pâte à polissage contenant un véhicule et des grains à fonctions alumines. La présente pâte à polissage, qui contient des grains à fonctions alumines, présente une bonne stabilité, et cette pâte à polissage peut minimiser le taux de défauts, améliorer la qualité de la surface du substrat, réduire le taux total de perte de métaux, et élargir la gamme de variation des paramètres technologiques.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAI8PfxDPbw9HNXCPYJDQqK5GFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgYGZoZGRiaWRo6GxsSpAgCN8x6d</recordid><startdate>20061123</startdate><enddate>20061123</enddate><creator>SHIAO, DANNY, ZHENGLONG</creator><creator>YANG, ANDY, CHUNXIAO</creator><scope>EVB</scope></search><sort><creationdate>20061123</creationdate><title>POLISHING SLURRY</title><author>SHIAO, DANNY, ZHENGLONG ; YANG, ANDY, CHUNXIAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2006122492A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng ; fre</language><creationdate>2006</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIAO, DANNY, ZHENGLONG</creatorcontrib><creatorcontrib>YANG, ANDY, CHUNXIAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIAO, DANNY, ZHENGLONG</au><au>YANG, ANDY, CHUNXIAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLISHING SLURRY</title><date>2006-11-23</date><risdate>2006</risdate><abstract>The present invention discloses a polishing slurry, wherein, the said polishing slurry contains a carrier and functional-alumina grains. The present polishing slurry which contains functional - alumina grains has good stability, this polishing slurry can reduce the rate of defect , improve the quality of the substrate surface, lessen the total metal loss rate and widen the variation range of the technological parameters.
La présente invention concerne une pâte à polissage, ladite pâte à polissage contenant un véhicule et des grains à fonctions alumines. La présente pâte à polissage, qui contient des grains à fonctions alumines, présente une bonne stabilité, et cette pâte à polissage peut minimiser le taux de défauts, améliorer la qualité de la surface du substrat, réduire le taux total de perte de métaux, et élargir la gamme de variation des paramètres technologiques.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
title | POLISHING SLURRY |
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