ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS

An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46...

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Bibliographische Detailangaben

Hauptverfasser:	RAUM, MICHAEL, SOHMER, ALEXANDER, EGGER, RAFAEL, ULRICH, WILHELM, FELDMANN, HEIKO, FUERTER, GERHARD, MOEGELE, ARTUR, DODOC, AURELIAN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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