A METHOD AND APPARATUS FOR MEASUREMENT OF CHROMATIC ABERRATIONS OF OPTICAL SYSTEMS

Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target (64) having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The d...

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Hauptverfasser: LYUBCHIK, YAKOV, ASCHKENASY, JACQUES
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ASCHKENASY, JACQUES
description Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target (64) having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The difference of the edge images generated by the optical system (60) when illuminated by the first illumination and the second illumination measured in a predefined plane represents the optical artifact. L'invention concerne un procédé de mesure d'un artéfact d'un système optique, consistant à introduire dans le parcours optique d'une mesure, une cible ayant au moins un bord illuminant une section du bord par une première illumination, et illuminant une autre section du bord par une seconde illumination. La différence des images de bord générées par le système optique lorsqu'il est illuminé par la première illumination et la seconde illumination, mesurée dans un plan prédéfini représente l'artéfact optique.
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
title A METHOD AND APPARATUS FOR MEASUREMENT OF CHROMATIC ABERRATIONS OF OPTICAL SYSTEMS
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