SEMICONDUCTOR DEVICE MANUFACTURING METHOD

There is provided a technique for improving reliability of an error detection system by reducing the number of erroneous alarms. In order to achieve this object, a semiconductor device manufacturing method forms a first pattern (well pattern) and a second pattern (gate electrode pattern) in accordan...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NAKAJIMA, TOSHIHIRO, TOKOROZUKI, KAZUYUKI, YOKOUCHI, TETSUJI
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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