MOAT SYSTEM FOR AN IMPRINT LITHOGRAPHY TEMPLATE

The present invention is directed to a body having a first area and a second area separated by a recess. The recess is dimensioned to reduce, if not prevent a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned wi...

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Hauptverfasser:	MCMACKIN, IAN M, LAD, PANKAJ B
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SPRAYING OR ATOMISING IN GENERAL TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
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creator	MCMACKIN, IAN M LAD, PANKAJ B
description	The present invention is directed to a body having a first area and a second area separated by a recess. The recess is dimensioned to reduce, if not prevent a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned within one of the first and second areas. In this manner, the recess functions as a moat by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks. La présente invention concerne un corps comportant une première zone et une deuxième zone séparées par un évidement. L'évidement est dimensionné pour réduire, voire empêcher, l'écoulement d'un liquide sur une surface du corps, entre les première et deuxième zones. Un ou plusieurs repères d'alignement peuvent être positionnés dans une des première et deuxième zones. De cette manière, l'évidement fait office de fossé qui sert à réduire, voire à empêcher, la superposition d'une certaine quantité de liquide sur les repères d'alignement.
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The recess is dimensioned to reduce, if not prevent a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned within one of the first and second areas. In this manner, the recess functions as a moat by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks. La présente invention concerne un corps comportant une première zone et une deuxième zone séparées par un évidement. L'évidement est dimensionné pour réduire, voire empêcher, l'écoulement d'un liquide sur une surface du corps, entre les première et deuxième zones. Un ou plusieurs repères d'alignement peuvent être positionnés dans une des première et deuxième zones. De cette manière, l'évidement fait office de fossé qui sert à réduire, voire à empêcher, la superposition d'une certaine quantité de liquide sur les repères d'alignement.</abstract><oa>free_for_read</oa></addata></record>
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subjects	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SPRAYING OR ATOMISING IN GENERAL TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
title	MOAT SYSTEM FOR AN IMPRINT LITHOGRAPHY TEMPLATE
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