CONTAMINANT REDUCING SUBSTRATE TRANSPORT AND SUPPORT SYSTEM

A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of redu...

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Hauptverfasser: MARTIN, TODD, W, KHURANA, NITIN, RICE, MICHAEL, PARKHE, VIJAY, D, NG, EDWARD, TSAI, MATTHEW, C, SANSONI, STEVE, HAGERTY, CHRISTOPHER, FAY, RICHARD, ANGELO, DARRYL, RONAN, TIMOTHY, AHMAN, KURT, J, SUH, SONG-MOON, LEOPOLD, MATTHEW
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creator MARTIN, TODD, W
KHURANA, NITIN
RICE, MICHAEL
PARKHE, VIJAY, D
NG, EDWARD
TSAI, MATTHEW, C
SANSONI, STEVE
HAGERTY, CHRISTOPHER
FAY, RICHARD
ANGELO, DARRYL
RONAN, TIMOTHY
AHMAN, KURT, J
SUH, SONG-MOON
LEOPOLD, MATTHEW
description A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon. In another version, contamination of substrate is reduced by providing a substrate lifting assembly having a pair of arcuate fins with raised protrusions to support the substrates. La présente invention se rapporte à un support de substrat, qui comprend une structure de support, et un revêtement placé sur la structure de support et contenant un réseau carbone-hydrogène. Le revêtement possède une surface de contact présentant un coefficient de frottement inférieur à environ 0,3 et une dureté d'au moins 8 GPa. La surface de contact du revêtement peut réduire l'abrasion et la contamination d'un substrat qui est mis en contact avec la surface de contact. Dans une variante, la structure de support est dotée d'un diélectrique recouvrant une électrode. Un revêtement à surface de contact est disposé sur une pluralité de mésas contenues sur le diélectrique. Dans une autre variante, l'on réduit la contamination de substrats grâce à un ensemble porteur de substrat possédant une paire d'ailettes curvilignes dotées de saillies surélevées pour supporter les substrats.
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The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon. In another version, contamination of substrate is reduced by providing a substrate lifting assembly having a pair of arcuate fins with raised protrusions to support the substrates. La présente invention se rapporte à un support de substrat, qui comprend une structure de support, et un revêtement placé sur la structure de support et contenant un réseau carbone-hydrogène. Le revêtement possède une surface de contact présentant un coefficient de frottement inférieur à environ 0,3 et une dureté d'au moins 8 GPa. La surface de contact du revêtement peut réduire l'abrasion et la contamination d'un substrat qui est mis en contact avec la surface de contact. Dans une variante, la structure de support est dotée d'un diélectrique recouvrant une électrode. Un revêtement à surface de contact est disposé sur une pluralité de mésas contenues sur le diélectrique. 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KHURANA, NITIN ; RICE, MICHAEL ; PARKHE, VIJAY, D ; NG, EDWARD ; TSAI, MATTHEW, C ; SANSONI, STEVE ; HAGERTY, CHRISTOPHER ; FAY, RICHARD ; ANGELO, DARRYL ; RONAN, TIMOTHY ; AHMAN, KURT, J ; SUH, SONG-MOON ; LEOPOLD, MATTHEW</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2005083752A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2005</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><toplevel>online_resources</toplevel><creatorcontrib>MARTIN, TODD, W</creatorcontrib><creatorcontrib>KHURANA, NITIN</creatorcontrib><creatorcontrib>RICE, MICHAEL</creatorcontrib><creatorcontrib>PARKHE, VIJAY, D</creatorcontrib><creatorcontrib>NG, EDWARD</creatorcontrib><creatorcontrib>TSAI, MATTHEW, C</creatorcontrib><creatorcontrib>SANSONI, STEVE</creatorcontrib><creatorcontrib>HAGERTY, CHRISTOPHER</creatorcontrib><creatorcontrib>FAY, RICHARD</creatorcontrib><creatorcontrib>ANGELO, DARRYL</creatorcontrib><creatorcontrib>RONAN, TIMOTHY</creatorcontrib><creatorcontrib>AHMAN, KURT, J</creatorcontrib><creatorcontrib>SUH, SONG-MOON</creatorcontrib><creatorcontrib>LEOPOLD, MATTHEW</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MARTIN, TODD, W</au><au>KHURANA, NITIN</au><au>RICE, MICHAEL</au><au>PARKHE, VIJAY, D</au><au>NG, EDWARD</au><au>TSAI, MATTHEW, C</au><au>SANSONI, STEVE</au><au>HAGERTY, CHRISTOPHER</au><au>FAY, RICHARD</au><au>ANGELO, DARRYL</au><au>RONAN, TIMOTHY</au><au>AHMAN, KURT, J</au><au>SUH, SONG-MOON</au><au>LEOPOLD, MATTHEW</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CONTAMINANT REDUCING SUBSTRATE TRANSPORT AND SUPPORT SYSTEM</title><date>2005-09-09</date><risdate>2005</risdate><abstract>A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon. In another version, contamination of substrate is reduced by providing a substrate lifting assembly having a pair of arcuate fins with raised protrusions to support the substrates. La présente invention se rapporte à un support de substrat, qui comprend une structure de support, et un revêtement placé sur la structure de support et contenant un réseau carbone-hydrogène. Le revêtement possède une surface de contact présentant un coefficient de frottement inférieur à environ 0,3 et une dureté d'au moins 8 GPa. La surface de contact du revêtement peut réduire l'abrasion et la contamination d'un substrat qui est mis en contact avec la surface de contact. Dans une variante, la structure de support est dotée d'un diélectrique recouvrant une électrode. Un revêtement à surface de contact est disposé sur une pluralité de mésas contenues sur le diélectrique. Dans une autre variante, l'on réduit la contamination de substrats grâce à un ensemble porteur de substrat possédant une paire d'ailettes curvilignes dotées de saillies surélevées pour supporter les substrats.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
title CONTAMINANT REDUCING SUBSTRATE TRANSPORT AND SUPPORT SYSTEM
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