NOVEL PHOTOSENSITIVE BILAYER COMPOSITION

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure (I), where R is a moiety containing an ethylenically unsaturated polymerizable group, R is a Cl-C3 alkylene group, and R is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted...

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Bibliographische Detailangaben
Hauptverfasser:	FOSTER, PATRICK, DE, BINOD, B, SPAZIANO, GREGORY
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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