NOVEL PHOTOSENSITIVE BILAYER COMPOSITION

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure (I), where R is a moiety containing an ethylenically unsaturated polymerizable group, R is a Cl-C3 alkylene group, and R is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FOSTER, PATRICK, DE, BINOD, B, SPAZIANO, GREGORY
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure (I), where R is a moiety containing an ethylenically unsaturated polymerizable group, R is a Cl-C3 alkylene group, and R is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted aromatic group, a C1-8 alkoxy methyl, or a C1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials. L'invention concerne des polymères et des copolymères à unités monomères formés par polymérisation de monomères de structure (I) dans laquelle R est une fraction contenant un groupe polymérisable éthyléniquement insaturé, R est un groupe Cl-C3 alkylène, et R est un groupe C1-10 alkyle linéaire ou cyclique, un groupe aromatique C6-10 ou aromatique substitué, un C1-8 alkoxy méthyle, ou un groupe C1-8 alkoxy éthyle. Ces polymères et copolymères sont utiles comme résines de liaison dans des compositions photosensibles. L'invention concerne également des procédés de photolitographie pour la fabrication de dispositifs et de matériaux à semi-conducteurs.