PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN
A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130°C, (iii) 20 to 60 wt.-%...
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| creator | DWARS, UDO DRABER, AXEL MURSAL, MICHAEL BAUMANN, HARALD |
| description | A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130°C, (iii) 20 to 60 wt.-% of at least one alkanol with a boiling point below 120°C, and (iv) 10 to 30 wt.-% ethyl lactate, and a slot coater are used.
L'invention concerne un procédé de production de précurseurs de plaque d'impression lithographique comportant un revêtement comprenant une résine diazo, dans lequel on utilise un mélange de solvants contenant (i) 2 à 9,9 % en poids de 1-méthoxy-2-propanol, (ii) 20 à 50 % en poids d'au moins une cétone avec un point d'ébullition inférieur à 130 DEG C, (iii) 20 à 60 % en poids d'au moins un alcanol avec un point d'ébullition inférieur à 120 DEG C, et (iv) 10 à 30 % en poids de lactate d'éthyle, et un système d'enduction de fente. |
| format | Patent |
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L'invention concerne un procédé de production de précurseurs de plaque d'impression lithographique comportant un revêtement comprenant une résine diazo, dans lequel on utilise un mélange de solvants contenant (i) 2 à 9,9 % en poids de 1-méthoxy-2-propanol, (ii) 20 à 50 % en poids d'au moins une cétone avec un point d'ébullition inférieur à 130 DEG C, (iii) 20 à 60 % en poids d'au moins un alcanol avec un point d'ébullition inférieur à 120 DEG C, et (iv) 10 à 30 % en poids de lactate d'éthyle, et un système d'enduction de fente.</description><edition>7</edition><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040916&DB=EPODOC&CC=WO&NR=2004057421A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040916&DB=EPODOC&CC=WO&NR=2004057421A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DWARS, UDO</creatorcontrib><creatorcontrib>DRABER, AXEL</creatorcontrib><creatorcontrib>MURSAL, MICHAEL</creatorcontrib><creatorcontrib>BAUMANN, HARALD</creatorcontrib><title>PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN</title><description>A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130°C, (iii) 20 to 60 wt.-% of at least one alkanol with a boiling point below 120°C, and (iv) 10 to 30 wt.-% ethyl lactate, and a slot coater are used.
L'invention concerne un procédé de production de précurseurs de plaque d'impression lithographique comportant un revêtement comprenant une résine diazo, dans lequel on utilise un mélange de solvants contenant (i) 2 à 9,9 % en poids de 1-méthoxy-2-propanol, (ii) 20 à 50 % en poids d'au moins une cétone avec un point d'ébullition inférieur à 130 DEG C, (iii) 20 à 60 % en poids d'au moins un alcanol avec un point d'ébullition inférieur à 120 DEG C, et (iv) 10 à 30 % en poids de lactate d'éthyle, et un système d'enduction de fente.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi80KgkAUhd20iOodLrQOTA3Xwzg6l2yuzFwT2ojEtIoSbNfLN0YP0Or8fWcZvRtLUjkHJVlgrSDkopWMZIBKMKoSjGcFHdkjmgpqZE2VFY1GGVg0PLdNLXi-KtlaR9ZBFzAQIEl8d0mnwLrZFiguBFaFsI4Wt-E--c1PV9G2VCz1zo_P3k_jcPUP_-o7SuI4iw95luxFmv5HfQB8NDwr</recordid><startdate>20040916</startdate><enddate>20040916</enddate><creator>DWARS, UDO</creator><creator>DRABER, AXEL</creator><creator>MURSAL, MICHAEL</creator><creator>BAUMANN, HARALD</creator><scope>EVB</scope></search><sort><creationdate>20040916</creationdate><title>PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN</title><author>DWARS, UDO ; DRABER, AXEL ; MURSAL, MICHAEL ; BAUMANN, HARALD</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2004057421A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>DWARS, UDO</creatorcontrib><creatorcontrib>DRABER, AXEL</creatorcontrib><creatorcontrib>MURSAL, MICHAEL</creatorcontrib><creatorcontrib>BAUMANN, HARALD</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DWARS, UDO</au><au>DRABER, AXEL</au><au>MURSAL, MICHAEL</au><au>BAUMANN, HARALD</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN</title><date>2004-09-16</date><risdate>2004</risdate><abstract>A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130°C, (iii) 20 to 60 wt.-% of at least one alkanol with a boiling point below 120°C, and (iv) 10 to 30 wt.-% ethyl lactate, and a slot coater are used.
L'invention concerne un procédé de production de précurseurs de plaque d'impression lithographique comportant un revêtement comprenant une résine diazo, dans lequel on utilise un mélange de solvants contenant (i) 2 à 9,9 % en poids de 1-méthoxy-2-propanol, (ii) 20 à 50 % en poids d'au moins une cétone avec un point d'ébullition inférieur à 130 DEG C, (iii) 20 à 60 % en poids d'au moins un alcanol avec un point d'ébullition inférieur à 120 DEG C, et (iv) 10 à 30 % en poids de lactate d'éthyle, et un système d'enduction de fente.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN |
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